Author: Li, M.
Paper Title Page
TUKAM01
X-ray Optical Technology at High Energy Photon Source (HEPS)  
 
  • M. Li
    IHEP, Beijing, People’s Republic of China
 
  HEPS, the 4th generation synchrotron radiation facility, is under construction in Beijing. The designed electron energy is 6GeV and the emittance is lower than 60pm·rad. The high-quality X-ray near diffraction limit brings unprecedented challenges to optical technology. This talk will present the progress of construction of HEPS briefly including accelerator, beamline and so on. It will be emphasized that the R&D status of X-ray optical technology at HEPS, such as optical metrology, fabrication, manipulation and so on.  
slides icon Slides TUKAM01 [8.975 MB]  
Cite • reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)  
 
TUOAM05 Thermal-Deformation-Based X-Ray Active Optics Development in IHEP 10
 
  • F.G. Yang, D.Z. Diao, H. Dong, J. Han, M. Li, W.F. Sheng, S.F. Wang, X.W. Zhang
    IHEP, Beijing, People’s Republic of China
  • L. Kang
    IHEP CSNS, Guangdong Province, People’s Republic of China
 
  Funding: National Natural Science Foundation of China (11505212, 11875059); Youth Innovation Promotion Association of the Chinese Academy of Sciences (2019012).
Advanced light source require small wavefront distortion to maintain the quality of the X-ray beam. Active optical wavefront correction technology is a very important solution to solve the service problems of ultra-precise devices under such conditions. In this paper, we will report our recent progress on this active optics system development including surface metrology and mirror modulation. Based on the research of laser-heating-based thermal deformation modulation technology, this project proposes to modify the mirror surface of X-ray mirrors based on semiconductor microfabrication process, and modulate the local deformation of the mirror surface by electric heating to realize the surface shape correction /modulation of X-ray mirrors. Since the modulation unit acts directly on the reflective region of the mirror surface, it has a better surface shape correction capability than the conventional body deformation modulation. The solution also has the advantage of high efficiency and low cost.
*Yang F, Li M, Gao L, et al. Laser-heating-based active optics for synchrotron radiation applications[J]. Optics Letters, 2016, 41(12): 2815-2818.
 
slides icon Slides TUOAM05 [18.205 MB]  
DOI • reference for this paper ※ doi:10.18429/JACoW-MEDSI2023-TUOAM05  
About • Received ※ 02 November 2023 — Revised ※ 03 November 2023 — Accepted ※ 09 November 2023 — Issued ※ 01 February 2024
Cite • reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)  
 
TUOBM05 The Progress in Design, Preparation and Measurement of MLL for HEPS 24
 
  • S.P. Yue, G.C. Chang, Q. Hou, B. Ji, M. Li
    IHEP, Beijing, People’s Republic of China
 
  Funding: This work was supported by the National Natural Science Foundation of China (Project12005250¿
The multilayer Laue lens (MLL) is a promising optical element with large numerical aperture and aspect ratio in synchrotron radiation facility. Two multilayers with 63(v)×43(h) ¿m2 aperture and focal spot size of 8.1(v)×8.1(h)nm2 at 10keV are fabricated by a 7-meter-long Laue lens deposition machine. Ultrafast laser etching, dicing and FIB are used to fabricate the multilayer into two-dimensional lenses meeting the requirement of diffraction dynamics. The multilayer grows flat without distortion and shows an amorphous structure characterized by TEM and SAED. The smallest accumulated layer position error is below ±5 nm in the whole area and the rms error is about 2.91nm by SEM and image processing. The focusing performance of MLL with actual film thickness is calculated by a method based on the Takagi¿Taupin description (TTD). The full width at half maximum(FWHM) of focus spot is 8.2×8.4 nm2 which is close to the theoretical result.
 
slides icon Slides TUOBM05 [7.563 MB]  
DOI • reference for this paper ※ doi:10.18429/JACoW-MEDSI2023-TUOBM05  
About • Received ※ 24 October 2023 — Revised ※ 03 November 2023 — Accepted ※ 09 November 2023 — Issued ※ 18 May 2024
Cite • reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)  
 
TUOBM07
Newly Developed Wavefront Metrology Technique and Applying in Crystal Processing  
 
  • F. Liu, Q.S. Diao, Z. Hong, M. Li, H. Lian, J.L. Yang
    IHEP, People’s Republic of China
 
  In this work, we firstly propose an innovative wavefront metrology method at Beijing Synchrotron Radiation Facility (BSRF), named the double edges scan (DES) wavefront metrology technique. As the method resolved several vital problems of the first-generation synchrotron radiation source, including inferior lateral coherence, poor stability, and distortion of incident wavefront, it realized diffraction limit level wavefront metrology and has been successfully applied to crystal processing, which regarded as an important feedback of the fourth-generation synchrotron radiation source crystal fabrication process. The DES can achieve the precision better than 22.5 nrad (rms) with a 50 microns lateral resolution on crystal surface. The crystal we measured was processed by magnetically controlled small tool, which is also a creative processing technic. The technique gets rid of the limitation of the power system and transmission system, and realized the free machining of channel-cut crystal with narrow space.  
slides icon Slides TUOBM07 [4.007 MB]  
Cite • reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)  
 
TUPYP010
A Novel Coating to Avoid Corrosion Effect and Vibration Coupling Between Eutectic Gallium-Indium Alloy and Heat Sink Metal for X-Ray Optics Cooling  
 
  • T. He, M. Li, W.C. Liu, Z.N. Ou, Z.R. Ren, W.F. Sheng, S. Tang, J.L. Yang, H.H. Yu, X.M. Zhang
    IHEP, Beijing, People’s Republic of China
  • T. He, M. Li, W.C. Liu, W.F. Sheng, S. Tang, J.L. Yang, H.H. Yu, X.M. Zhang
    University of Chinese Academy of Sciences, Beijing, People’s Republic of China
 
  Although the vibration decoupling method based on eutectic gallium-indium (EGaIn) alloy performs excellent in suppressing parasitic vibration caused by the cooling medium and pipes of X-ray optics, the corrosion of EGaIn alloy to the heat sink metal still results in the solidification and the vibration decoupling failure. A novel anti-corrosion coating based on tungsten(W) is proposed. Through the analysis of the micromorphology and the chemical composition after heating for 36 hours at 250°C, there is no obvious evidence that W is corroded which is more effective than the widely used coating of nickle(Ni). And the W coating by using magnetron sputtering has been implemented for feasibility validation. Its corrosion resistance mechanism has also been fully analyzed. Besides, finite element analysis on the differences of vibration decoupling after applying W coatings and Ni coatings are also carried out and discussed. W is proved to be a considerable coating for vibration decoupling to face up to the challenge of the ultra-high requirements of high stability (~10nrad RMS), high surface shape accuracy (¿50nrad RMS) in diffraction-limited storage ring light source.  
poster icon Poster TUPYP010 [10.504 MB]  
Cite • reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)  
 
TUPYP012
Mechanical Design of Water-cooled White Beam Collimating Bent Mirror System at HEPS  
 
  • J.Y. Wang, M. Li, Z.R. Ren, W.F. Sheng, S. Tang, R.Z. Xu
    IHEP, Beijing, People’s Republic of China
 
  The main function of the Water-cooled White Beam Collimating Bent Mirror is to align the synchrotron radiation light to improve the resolution of its downstream monochromator; It also absorbs heat and reduces the heat load transmitted to the monochromator. Therefore, the accuracy of its posture directly affects the quality of the output beam. This article discusses the design of the device. It is mainly divided into 3 parts. The bending mechanism uses constant external force to elastically bend the optical elements to obtain the required surface shape. The cooling mechanism is used to reduce the thermal deformation of the mirror surface, thus reducing the surface error of the mirror. The overall mechanical system provides 5-DOF attitude adjustment. Based on this, this design adopts a combination scheme of a four-bar bender with independent bending moment, the copper blades inserted in the GaIn eutectic filled trough solution and 5-DOF attitude adjustment of multi-layer granite. Through a series of calculations, simulations and tests, it is demonstrated that the design indexes meet the requirements, thus verifying the feasibility of the scheme.  
Cite • reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)  
 
TUPYP019
Optical Metrology of High Energy Photon Source  
 
  • C.R. Zhang, R.L. Cui, M. Li, D.N. Zhang
    IHEP, Beijing, People’s Republic of China
 
  Funding: High Energy Photon Source Platform of Advanced Photon Source technology research and development Beijing Synchrotron Radiation Facility, Institute of High Energy Physics
The fourth-generation synchrotron light sources-High Energy Photon Source(HEPS) requires the accuracy of X-ray mirror surface slope and height error to be as high as 50 nrad(rms) and 0.4nm (rms), respectively. Its a huge challenge to detect the X-ray mirrors with such high-precision specification. A new type long trace profiler named FSP (Flag-type Surface Profiler), which is independently developed by Institute of High Energy Physics, Chinese Academy of Sciences, providing high-precision surface shape Metrology services for the X-mirrors of HEPS. So far, we have completed the surface shape Metrology of 25 HEPS high-precision X-ray mirrors, and the surface shape Metrology of FSP were also recognize approved by JTEC. Among them, the Wolter diffraction limit focusing mirror processed by JTEC Company in Japan, the height error is 0.1nm RMS at 1mm high spatial resolution (0.11nm RMS for Wolter KB elliptic area and 0.12nm RMS for hyperbolic area). So far this is the most accurate X-ray mirror for HEPS. At the same time, we also developed the Spatial Frequency decomposition stitching Interferometer (FSI), the standard deviation of surface shape Metrology of FSP and FSI reached 0.33nm.
 
Cite • reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)  
 
TUPYP041
Design for Harmonic Suppression Mirrors Mechanical System with X-Ray Height Compensation Function at HEPS  
 
  • Z.R. Ren, M. Li, W.F. Sheng, S. Tang, L.R. Zheng
    IHEP, Beijing, People’s Republic of China
 
  In view of the fact that the Harmonic Suppression Mirrors (HSMs) mechanical system under the fast scanning mode of the X-ray Absorption Spectroscopy Beamline (XAS Beamline) of High Energy Photon Source (HEPS) needs to have a X-ray height compensation function in addition to suppressing high harmonics. This paper introduces a high stability 9-axis HSMs mechanical system, which has a basic 5-DOF adjustment, and the relative position relationship between the two mirrors is adjustable. By changing the center distance between the two mirrors, the gap between the two mirrors, and adjusting the parallelism of the two mirrors, the goal of compensating the output X-ray height difference of the upstream Channel Cut Monochromator is achieved. The vacuum machinery volume of the entire HSMs mechanical system is relatively large, which reaches 1766mm. Movement travel of the second mirrors reaches 620mm. Currently, the vacuum machinery has been processed and further testing is being carried out.  
Cite • reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)  
 
TUPYP043 The Design of Test Beamline at HEPS 90
 
  • J.L. Yang, Q.J. Jia, M. Li, P. Liu, Y. Tao
    IHEP, Beijing, People’s Republic of China
 
  This paper describes the design of a test beamline for a new generation of high-energy, high-flux, and high-coherence SR beamlines. The beamline will be built at ID42 of HEPS. The beamline includes two sources, a wiggler and an undulator, to provide high-energy, high thermal power, large size, and high-coherence, high-brightness X-ray beams, respectively. In the current design, the beamline mainly has optical components such as monochromators, CRLs, and filters. With different combinations of sources and optical components, the beamline can provide various modes, including white, monochromatic, and focused beam. Using a Si111 DCM, the beamline covers a wide photon energy range from 5 to 45 keV. In the future, the beamline will be capable of providing monochromatic beam with photon energy over 300 keV. The wiggler’s white beam can provide high thermal load test conditions over 1 kW. The beamline offers high flexibility and versatility in terms of available beam size (from micrometers to over 100 mm), energy resolution, and photon flux range. Various experimental techniques including diffraction, spectroscopy, imaging, and at-wavelength measurement can be performed on this beamline.  
DOI • reference for this paper ※ doi:10.18429/JACoW-MEDSI2023-TUPYP043  
About • Received ※ 08 November 2023 — Revised ※ 09 November 2023 — Accepted ※ 10 November 2023 — Issued ※ 18 April 2024
Cite • reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)  
 
TUPYP044
Development of Typical Nano-KB/AKB Mirrors Mechanical System at HEPS  
 
  • H.H. Yu, M. Li, R.Y. Liao, W.F. Sheng, S. Tang, R.Z. Xu
    IHEP, People’s Republic of China
  • Y. Li
    BUAA, Beijing, People’s Republic of China
  • Y. Li
    Rejected, -, Tanzania
  • S. Tang, H.H. Yu
    UCAS, Beijing, People’s Republic of China
 
  Nano-KB/AKB mirrors are used to focus spot size to the nanometer level in main performance beamlines at HEPS, including the Hard X-ray Nanoprobe Multimodal Imaging Beamline(NAMI Beamline), the Hard X-ray Coherent Scattering Beamline(HXCS Beamline), and X-ray Absorption Spectroscopy Beamline(XAS Beamline), etc. For the typical Nano-KB/AKB mirrors mechanical system, a common design of the mounting and clamping mechanisms and the adjustment mechanisms is presented. There are also the key components of the Nano-KB/AKB mirrors mechanical system. Currently, through the design and optimisation of the mechanical structure and the corresponding finite element analysis(FEA), the first Nano-KB mirrors mechanical system at HEPS has been fabricated, and the large travel range, high resolution and high stability adjustments mechanisms are achieved, the slope error of the Nano-KB mirrors is well ensured simultaneously, and the test results are consistent with the design.  
Cite • reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)  
 
WEOBM02 Development of the Bent Focusing Mirror in HEPS from Design to Test 136
 
  • M.W. Chen, M. Li, S. Tang, F.G. Yang
    IHEP, Beijing, People’s Republic of China
 
  The focusing mirrors are important for each beamline in the 4th generation photon source. One bent focusing face-down mirror in HEPS is taken for an example to be introduced from the design to the test. The effect of the gravity of the mirror is considered in the design. Moreover, for the sake of the compromise between the processing and the precision, the polygonal structure is adopted. Also, the iteration of the solution is improved to increase the design efficiency. The results reveal that the theoretical precision of the mirror after bending can reach less than 100 nrad RMS. In the aspect of the mechanics, the scheme of four roller bender comes out to avoid the parasitic moment, and the movable component in the bender are all coated with the MoS2. As the type of the measurement is facing side which is different from the type of the actual condition, the effect of the gravity must be included in the metrology results. In the meantime, the stability and the repeatability are also measured. The result can be converged to around 200 nrad RMS, which is less than the required error. The stability, ¿R/R, can be constrained under the 0.6%, showing the outstanding performance.  
slides icon Slides WEOBM02 [3.638 MB]  
DOI • reference for this paper ※ doi:10.18429/JACoW-MEDSI2023-WEOBM02  
About • Received ※ 25 October 2023 — Revised ※ 05 November 2023 — Accepted ※ 07 November 2023 — Issued ※ 16 April 2024
Cite • reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)  
 
WEPPP014
Research on High Quality Channel-Cut Crystal Optics for High Energy Photon Source  
 
  • Z. Hong, Q.S. Diao, M. Li, H. Lian
    IHEP, People’s Republic of China
  • M. Li
    University of Chinese Academy of Sciences, Beijing, People’s Republic of China
 
  Funding: 1 National Natural Science Foundation of China (NSFC; Proposal No. 12105310). 2 The High Energy Photon Source project, a major national science and technology infrastructure in China.
In this paper, a machining scheme of magnetically controlled small tool was proposed, which gets rid of the limitation of the power system and transmission system, and realized the free machining of channel-cut crystal with narrow space, a high quality channel-cut crystal with high wavefront maintenance and high transmission efficiency in a large size range was obtained. The results of offline characterization showed that: The roughness of inner surfaces reached 0.6nm RMS; Microstructure analysis show that the perfect lattice substrate was only covered 2.5nm thickness uniform SiO₂ layer, and there was no uneven bending of the oxide layer caused byμstress concentration. The results of online tests showed that: the Darwin widths of the channel-cut crystal processed by MC-CMP were consistent with the theoretical values, the two diffraction reflectivity rate of the crystal reached 85.1%, very close to the theoretical limit of 88.3%. The morphology of channel-cut crystal treated by MC-CMP technology was uniform, scratches and spot defects were eliminated completely. The wavefront equivalent crystal profile error of the two diffraction reached 130nrad RMS with 5 mm dimension.
 
Cite • reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)  
 
WEPPP019 Coating Removal of Silicon-Based Mirror in Synchrotron Radiation by Soluble Underlayers 181
 
  • Q. Hou, G.C. Chang, B. Ji, M. Li, S.P. Yue
    IHEP, People’s Republic of China
 
  Multilayer optics is widely used for the x-ray beam monochromatization, focusing, and collimation in synchrotron light source. However, the multilayer coatings might be damaged by the high heat loads, the poor film adhesion, the high internal stress, or the inadequate vacuum conditions. As a result, it is essential to develop a method to make the optical substrate reusable without compromising its quality. In our published work, we successfully prepared a W/B4C multilayer coating with a 2 nm Cr buffer layer on a small-sized Si wafer. The coating was stripped from the Si substrate by dissolving the Cr buffer layer using an etchant. After the etching process, the sample’s roughness was comparable to that of a brand-new substrate. We have since utilized this method to clean the multilayers on the surface of a 20 cm × 5 cm silicon-based mirror for High Energy Photon Source (HEPS). The surface roughness and shape were measured, and they reached the level of a brand-new mirror.  
DOI • reference for this paper ※ doi:10.18429/JACoW-MEDSI2023-WEPPP019  
About • Received ※ 02 November 2023 — Revised ※ 04 November 2023 — Accepted ※ 06 November 2023 — Issued ※ 19 December 2023
Cite • reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)  
 
THOAM04 Overall Progress on Development of X-ray Optics Mechanical Systems at High Energy Photon Source (HEPS) 252
 
  • S. Tang, Y.H. Dong, X.H. Kuang, M. Li, H. Liang, R.Y. Liao, L.H. Ma, Z.N. Ou, H. Qian, Z.R. Ren, W.F. Sheng, J. Wang, R.Z. Xu, H.H. Yu
    IHEP, People’s Republic of China
 
  Funding: This work is supported by the project of High Energy Photon Source (HEPS).
High Energy Photon Source (HEPS) regarded as a new 4th generation synchrotron radiation facility, is under construction in a virgin green field in Beijing, China. The X-ray optics/mirror mechanical systems (MMS) play an important role, which would be expected to be designed carefully and rigidly for the extremely stable performance requirement of HEPS. In addition, there are indeed big challenges due to so many types of mirror systems, such as white beam mirror (WBM), harmonic suppression mirror (HSM), combined deflecting mirror (CDM), bending mirror, Nano-KB, and the transfocator of Compound refractive lens (CRLs), etc. Therefore, overall progress on design and maunfacturing of the MMS is introduced, in which a promoting strategy and generic mirror mechanical system as a key technology is presented and developed for the project of HEPS. Furthermore, ultra-stable structucture, multi-DOF precision positioning, Eutectic Galium Indium (E-GaIn)-based vibration-decoupling watercooling, clamping, and bending have always been prior designs and considerations.
Shanzhi Tang, Weifan Sheng, Jianye Wang, et al, Overall progress on the design of mirror mechanical systems at High Energy Photon Source (HEPS), SRI2021, Hamburg Germany, 2022. POSTER
 
slides icon Slides THOAM04 [2.328 MB]  
DOI • reference for this paper ※ doi:10.18429/JACoW-MEDSI2023-THOAM04  
About • Received ※ 30 October 2023 — Revised ※ 05 November 2023 — Accepted ※ 10 November 2023 — Issued ※ 18 July 2024
Cite • reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)  
 
THOBM03
Progress and Core Technologies Development of Monochromators for HEPS  
 
  • H. Liang, M.W. Chen, X.B. Deng, Q.S. Diao, L. Gao, Z. Hong, G. Li, M. Li, Z.K. Liu, Y.S. Lu, D.S. Shen, W.F. Sheng, S.F. Wang, Y. Yang, Z.Y. Yue, L. Zhang, S. Zhang, Y.S. Zhang, A.Y. Zhou
    IHEP, Beijing, People’s Republic of China
 
  HEPS is the first low emittance 4th generation light source in China, as monochromators are often limiting the performance of beamlines, many challenges are faced to preserve the quality of the beam. In order to meet the stringent and versatile requirements of 12 in house developed monochromators for different beamlines, several core technologies have been studied and developed. Stability considerations, vibration measurement system and methods are introduced, stability below 10 nrad RMS are measured for operation conditions by laser interferometers. Thermal resistance study at low temperature was carried out, enabling more accurate FEA of cooling. Clamping deformation of crystals at low temperature are experimentally studied, slope errors below 0.1 microradian RMS are measured. Design and test results on different types of monochromators will also be presented. Results show that the in house developed monochromators are able to meet the requirements of HEPS beamlines.  
slides icon Slides THOBM03 [8.445 MB]  
Cite • reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)  
 
THPPP021
Ultra-Stable and Multi-DOF Bent KB Mirror Mechanical System for Hard X-Ray High Energy Resolution Spectroscopy (HX-HERS) Beamline of HEPS  
 
  • R.Z. Xu, M. Li, W.F. Sheng, S. Tang, H.H. Yu
    IHEP, Beijing, People’s Republic of China
 
  The KB mirror system designed for the HX-HERS beamline was expected to focus the spot size down to 2¿m×2¿m and achieve 5-DOF adjustment of each mirror. However, the long mirror length leaded large size of the overall mechanism and the limited height space for multi-dimensional adjustment makes the mechanical design of the KB system with both stability and functionality difficult. In this KB system, each mirror is bent by a four-bar bender universally used in HEPS to obtain the required profile. A combination of parallel and serial mechanism with totally 11-DOF is designed to realize the adjustment requirements. Specifically, the parallel mechanism is a three-point support design that serves as the base of the KB mirror chamber and offers coarse tuning of 5-DOF, exhibiting great compactness and high stiffness. The series mechanism is a stacking of four angle and two displacement adjustment mechanisms up to 6-DOF. These independent stages with high resolution are assigned to VFM and HFM respectively to achieve fine adjustment of their relative positions. In the design of each angle and displacement adjustment stage, the height and rigidity of the mechanism are also fully considered.  
Cite • reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)  
 
THPPP022
A compact direct measurement method for relative positioning of KB mirrors nano-experimental apparatus based on grating interferometers  
 
  • S. Tang, T. He, M. Li, R.Y. Liao, Z.N. Ou, W.F. Sheng, Y. Tao, H.H. Yu, L. Zhou
    IHEP, People’s Republic of China
  • T. He
    University of Chinese Academy of Sciences, Beijing, People’s Republic of China
  • H.H. Yu
    UCAS, Beijing, People’s Republic of China
 
  Funding: This work is supported by the project of High Energy Photon Source (HEPS).
Positioning measurement is regraded as an effective way for the position compensation and feedback of nano-experimental apparatus. However, it usually suffers many restrictions from the complicated applied occasion of a typical performance beamline for next-generation synchrotron radiation light source. To deal with the problem, a compact direct measurement method based on grating interferometers is presented. The principle, configuration, experiment are designed and implemented for the verification of the feasibility. It performs a high resolution in orthogonal/lateral direction relative to laser beam, which can overcome an infeasible shortage of a typical interferometer for direct lateral positioning. So, it is used for positioning measurement & compensation between KB mirrors and nano-stages of a sample for the experiments of CDI, bragg-CDI, pytchograph, XPCS, etc. Compared with the existed methods, huge frame, two vacuum chambers restriction, multi-axis interferometer and benchmark relay are avoided for the compact system by using proposed method.
 
poster icon Poster THPPP022 [2.006 MB]  
Cite • reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)  
 
THPPP033
Design of Ultra-Stable and Multi-DOF Generic Mirror Mechanical System at High Energy Photon Source (HEPS)  
 
  • L.H. Ma, M. Li, W.F. Sheng, S. Tang, J.Y. Wang
    IHEP, Beijing, People’s Republic of China
  • M. Li, W.F. Sheng
    University of Chinese Academy of Sciences, Beijing, People’s Republic of China
  • S. Tang
    UCAS, Beijing, People’s Republic of China
 
  The main function of the generic mirror chamber system in HEPS is to support, adjust the pose and provide the ultra-high vacuum environment of the optical elements in the beamline. Its pose adjustment requires micrometer or submicroradian level repetitive positioning accuracy and adjustment resolution. The white beam bending mirror chamber in the generic mirror chamber system of the Hard X-ray Nanoprobe Multimodal Imaging Beamline(B2) is taken as an example, to discuss the design of its pose adjustment mechanism. It needs to achieve 5-DOF for pose adjustment function. This paper proposes using a multi-layer marble structure and a combination of multiple motion mechanisms to achieve this function. The motor and screw-nut pair drive sliders can achieve 2-DOF adjustment. The motor and screw-nut pair drive two wedge-shaped blocks can achieve 2-DOF adjustment. The motor and straight circular flexible hinge drive a disc-type flexible hinge can achieve one angle adjustment. Finally, through series of numerical calculations, finite element simulations and physical experiments, it is demonstrated that the design indexes meet the requirements, thus verifying the feasibility of the scheme.  
Cite • reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)