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@unpublished{liu:medsi2023-tuobm07,
author = {F. Liu and Q.S. Diao and Z. Hong and M. Li and H. Lian and J.L. Yang},
title = {{Newly Developed Wavefront Metrology Technique and Applying in Crystal Processing}},
% booktitle = {Proc. MEDSI'23},
booktitle = {Proc. Int. Conf. Mech. Eng. Design Synchrotron Radiat. Equip. Instrum. (MEDSI'23)},
eventdate = {2023-11-06/2023-11-10},
language = {english},
intype = {presented at the},
series = {International Conference on Mechanical Engineering Design of Synchrotron Radiation Equipment and Instrumentation},
number = {12},
venue = {Beijing, China},
publisher = {JACoW Publishing, Geneva, Switzerland},
month = {07},
year = {2024},
note = {presented at MEDSI'23 in Beijing, China, unpublished},
abstract = {{In this work, we firstly propose an innovative wavefront metrology method at Beijing Synchrotron Radiation Facility (BSRF), named the double edges scan (DES) wavefront metrology technique. As the method resolved several vital problems of the first-generation synchrotron radiation source, including inferior lateral coherence, poor stability, and distortion of incident wavefront, it realized diffraction limit level wavefront metrology and has been successfully applied to crystal processing, which regarded as an important feedback of the fourth-generation synchrotron radiation source crystal fabrication process. The DES can achieve the precision better than 22.5 nrad (rms) with a 50 microns lateral resolution on crystal surface. The crystal we measured was processed by magnetically controlled small tool, which is also a creative processing technic. The technique gets rid of the limitation of the power system and transmission system, and realized the free machining of channel-cut crystal with narrow space.}},
}