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RIS citation export for WEPPP019: Coating Removal of Silicon-Based Mirror in Synchrotron Radiation by Soluble Underlayers

TY  - CONF
AU  - Hou, Q.
AU  - Chang, G.C.
AU  - Ji, B.
AU  - Li, M.
AU  - Yue, S.P.
ED  - Schaa, Volker R.W.
ED  - Bian, Lin
ED  - Chen, Zhichu
ED  - Dong, Yuhui
ED  - He, Ping
TI  - Coating Removal of Silicon-Based Mirror in Synchrotron Radiation by Soluble Underlayers
J2  - Proc. of MEDSI2023, Beijing, China, 06-10 November 2023
CY  - Beijing, China
T2  - International Conference on Mechanical Engineering Design of Synchrotron Radiation Equipment and Instrumentation
T3  - 12
LA  - english
AB  - Multilayer optics is widely used for the x-ray beam monochromatization, focusing, and collimation in synchrotron light source. However, the multilayer coatings might be damaged by the high heat loads, the poor film adhesion, the high internal stress, or the inadequate vacuum conditions. As a result, it is essential to develop a method to make the optical substrate reusable without compromising its quality. In our published work, we successfully prepared a W/B4C multilayer coating with a 2 nm Cr buffer layer on a small-sized Si wafer. The coating was stripped from the Si substrate by dissolving the Cr buffer layer using an etchant. After the etching process, the sample’s roughness was comparable to that of a brand-new substrate. We have since utilized this method to clean the multilayers on the surface of a 20 cm × 5 cm silicon-based mirror for High Energy Photon Source (HEPS). The surface roughness and shape were measured, and they reached the level of a brand-new mirror.
PB  - JACoW Publishing
CP  - Geneva, Switzerland
SP  - 181
EP  - 183
KW  - optics
KW  - synchrotron
KW  - synchrotron-radiation
KW  - radiation
KW  - photon
DA  - 2024/07
PY  - 2024
SN  - 2673-5520
SN  - 978-3-95450-250-9
DO  - doi:10.18429/JACoW-MEDSI2023-WEPPP019
UR  - https://jacow.org/medsi2023/papers/weppp019.pdf
ER  -