MEDSI2023 - List of Authors (Du, X.W.)

Paper	Title	Page
TUOAM03	Progress of Beamlines Design and Key Technologies of Hefei Advanced Light Facility
	X.W. Du, J. Chen, Z.K. Liu, Q.P. Wang, Z. Wang, S. Wei USTC/NSRL, Hefei, Anhui, People’s Republic of China
	A new synchrotron radiation light source, Hefei Advanced Light Facility (HALF), is under construction. This is the fourth-generation diffraction limited light source located in the low energy region. The storage ring energy is 2.2GeV, the circumference is about 480m, and the horizontal beam natural emittance is about 86.3pm.rad. Ten beamlines, including three coherent beamlines, will be built in the first phase. Due to the high coherence, high brightness and high resolution characteristics of diffraction limited light source, the beamline faces new challenges. This talk will present the progress of beamlines design and some key technology R&D of HALF.
	Slides TUOAM03 [3.921 MB]
Cite •	reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)

TUPYP026	Influence of the Groove Curvature on the Spectral Resolution in a Varied-Line-Spacing Plane Grating Monochromator (VLS-PGM)	67
	J. Du, X.W. Du, Q.P. Wang, Z. Wang USTC/NSRL, Hefei, Anhui, People’s Republic of China
	Diffraction-limited synchrotron radiation (DLSR) light source with smaller source size and emittance makes ultra-high spectral resolution beamline possible. Here, we report an undulator-based beamline optical design with ultra-high spectral resolution using a varied-line-spacing plane grating monochromator (VLS-PGM), which is a well-proven design for achieving ultra-high resolution in the soft X-ray band. A VLS plane grating with a central groove density of 2400 l/mm is utilized to cover the photon energy region of 250 ~ 2000eV. VLS gratings are generally fabricated using the holographic method, but the resulting grating grooves are two-dimensionally curved curves, which can affect the resolution of the monochromator. To analyse this effect, we first use a spherical wavefront and an aspherical wavefront to generate the fringes and optimized the recording parameters. We also present a method for calculating the groove curvature of holographic plane VLS grating grooves. Furthermore, the influence of grating groove curvature on beamline resolution is theoretically analysed based on the aberration theory of concave grating.
	Poster TUPYP026 [0.480 MB]
DOI •	reference for this paper ※ doi:10.18429/JACoW-MEDSI2023-TUPYP026
About •	Received ※ 25 October 2023 — Revised ※ 03 November 2023 — Accepted ※ 04 November 2023 — Issued ※ 12 March 2024
Cite •	reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)

TUPYP027	A Subnanometer Linear Displacement Actuator	70
	S.K. Jiang, X.W. Du, Q.P. Wang USTC/NSRL, Hefei, Anhui, People’s Republic of China
	With the development of synchrotron radiation technology, an actuator with sub-nanometer resolution, 100N driving force, and compatible with ultra-high vacuum environment is required. To achieve synchrotron radiation micro-nano focusing with adjustment resolution of sub-nanometer and high-precision rotation at the nano-arc level, most of the commercial piezoelectric actuators are difficult to meet the requirements of resolution and driving force at the same time. The flexure-based compound bridge-type hinge has the characteristic of amplifying or reducing the input displacement by a certain multiple, and can be used in an ultra-high vacuum environment. According to this characteristic, the bridge-type composite flexible hinge can be combined with commercial piezoelectric actuators, to design a new actuator with sub-nanometer resolution and a driving force of 100N. This poster mainly presents the principle of the new actuator, the design of the prototype and the preliminary test results of its resolution, stroke.
	Poster TUPYP027 [3.140 MB]
DOI •	reference for this paper ※ doi:10.18429/JACoW-MEDSI2023-TUPYP027
About •	Received ※ 25 October 2023 — Revised ※ 04 November 2023 — Accepted ※ 09 November 2023 — Issued ※ 25 January 2024
Cite •	reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)

TUPYP030	The Design of High Stability Double Crystal Monochromator for HALF	76
	Z.L. Xu, J. Chen, X.W. Du, Y. Peng, Q.P. Wang USTC/NSRL, Hefei, Anhui, People’s Republic of China
	HALF is a fourth-generation synchrotron light source with a number of state-of-the-art beamlines. Naturally, the new 4th generation machines, with their small emittances, start to bring higher stability performance requirements. In response to these problems, an concept of a high stability DCM (Double Crystal Monochromator) with angular range between 14 and 81 degrees (equivalent to 2 to 8 keV with Si(111)) has been developed at the National Synchrotron Radiation Laboratory. This poster gives an overview of the DCM prototype project including specifications, Mechanical design, heat load management and stability consideration.
	Poster TUPYP030 [1.221 MB]
DOI •	reference for this paper ※ doi:10.18429/JACoW-MEDSI2023-TUPYP030
About •	Received ※ 25 October 2023 — Revised ※ 04 November 2023 — Accepted ※ 08 November 2023 — Issued ※ 24 January 2024
Cite •	reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)

TUPYP032	An Argon-Oxygen or Argon-Hydrogen Radio-Frequency Plasma Cleaning Device for Removing Carbon Contamination from Optical Surfaces	79
	H.J. Yuan, X.W. Du, Q.P. Wang USTC/NSRL, Hefei, Anhui, People’s Republic of China
	Due to synchrotron radiation, carbon contamination on the surfaces of optical elements inside the beamlines, such as mirrors and gratings, remains an issue. Future beamline designs will select more optical element surface coating materials according to the specific needs, including gold, platinum, chromium, nickel, and aluminum, and a single cleaning method will not be able to adequately address the demands. We have studied the RF plasma cleaning of optical elements. After the argon/oxygen or argon/hydrogen gas mixture was injected into the chamber, glow discharge was carried out, and the carbon on the surface of the inert metal-coated optical element and oxidation-prone metal-coated optical element was removed by the oxidation or reduction reaction of radicals. In order to optimize the discharge parameters, it utilizes a differential mass spectrometry system and an optical emission spectrometer to monitor the cleaning process. This paper introduces the principles of the two cleaning methods as well as our existing cleaning device.
	Poster TUPYP032 [2.493 MB]
DOI •	reference for this paper ※ doi:10.18429/JACoW-MEDSI2023-TUPYP032
About •	Received ※ 25 October 2023 — Revised ※ 04 November 2023 — Accepted ※ 08 November 2023 — Issued ※ 19 December 2023
Cite •	reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)

THPPP007	Optimizing Indirect Cooling of a High Accuracy Surface Plane Mirror in Plane-Grating Monochromator	280
	J. Chen, X.W. Du, M.H. Lin, Q.P. Wang, Z. Wang USTC/NSRL, Hefei, Anhui, People’s Republic of China
	Funding: This work is supported by the Chinese Academy of Science (CAS) and the Anhui province government for key techniques R&D of Hefei Advanced Light Facility. For the cooling of the plane mirror in VIA-PGMs (var-iable-included-angle plane-grating monochromators), the top-side indirect cooling based on water is preferred for its advantages, such as cheaper, easier to use, smart notches, etc, when compared to the internal cooling. But it also arises challenges to control the RMS residual slope error of the mirror, whose requirement is less than 100 nano-radian. This requirement is even hard to fulfill, when combined with 1) the asymmetry thermal defor-mation on the meridian of the footprint area during the energy scanning, 2) the high heat load deduced by the synchrotron light and 3) the no obvious effects of the classical optimizations, such as increasing footprint size, cooling efficiency or adding smart notches. An effective way was found after numerous attempts, which is to make the footprint area far from the mirror¿s edge to reduce the asymmetry of the thermal deformation except for leading to a longer mirror. This paper will illustrate how the asymmetry affects the mirror¿s residual slope error and then, focus on the relationship among the asymmetry of cooling and the distance to provide a ref-erence for optical cooling.
	Poster THPPP007 [1.805 MB]
DOI •	reference for this paper ※ doi:10.18429/JACoW-MEDSI2023-THPPP007
About •	Received ※ 26 October 2023 — Revised ※ 06 November 2023 — Accepted ※ 08 November 2023 — Issued ※ 04 March 2024
Cite •	reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)

THPPP008	Optimization of Thermal Deformation of a Horizontally Deflecting High-Heat-Load Mirror Based on eInGa Bath Cooling	283
	J. Chen, X.W. Du, M.H. Lin, Q.P. Wang, Z. Wang USTC/NSRL, Hefei, Anhui, People’s Republic of China
	Funding: This work is supported by the Chinese Academy of Science (CAS) and the Anhui province government for key techniques R&D of Hefei Advanced Light Facility. The synchrotron facility are developing towards higher brightness, lower divergence, narrower pulse, higher stability, etc. Therefore, the requirements of the first mirror of the beamline, who bear high-heat-load, were upgraded, and the performances of the mirror will be affected easily by other factors, such as flow induced vibration, clamping force, etc. Indirect water cooling based on eInGa bath is regarded as an effective mean to solve these thorny problems in designing of the first mirror cooling. However, for the case a horizontal de-flection mirror, the unilateral cooling method is usually adopted, resulting in some changes in the structure of the mirror. In this paper, a first mirror horizontally deflect-ing in Hefei advanced light source (HALF) are taken as examples to introduce the optimization method to achieve ultra-low meridian slope error of the first hori-zontal deflection mirror. The results show that this opti-mization method provides a rapid design mean to design the cooling scheme of the horizontally deflecting mirror based on the eInGa bath.
	Poster THPPP008 [2.901 MB]
DOI •	reference for this paper ※ doi:10.18429/JACoW-MEDSI2023-THPPP008
About •	Received ※ 01 November 2023 — Revised ※ 06 November 2023 — Accepted ※ 08 November 2023 — Issued ※ 26 February 2024
Cite •	reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)

THPPP009	The Heat Load Calculation in the Grating-Based Beamline at Hefei Advanced Light Facility (HALF)	287
	Z. Wang, J. Chen, X.W. Du, D. Feng, Q.P. Wang USTC/NSRL, Hefei, Anhui, People’s Republic of China
	Funding: This work is supported by the Chinese Academy of Science (CAS) and the Anhui province government for key techniques R&D of Hefei diffraction limited light source. For the 4th generation synchrotron radiation (SR) light source, the heat load causes severe thermal deformation on the beamline optics as the emittance is reaching at the physical limit. The precise calculation of heat load on the optical elements is important for the thermal analysis including cooling method and thermal deformation simulation. A heat load calculation code has been developed for grating based SR beamline optics, which consists of modules of SR source simulation, mirror reflectivity and grating efficiency. The calculation results has been checked with SRCalc results. This code has been used to calculate the heat load of the Test Beamline optics at Hefei Advanced Light Facility (HALF). The heat absorbed by the first three optical elements¿including a toroidal mirror, a plane mirror and a plane grating¿is calculated. [1]R. Reininger. SRCalc (2001). Unpublished [2]L. Rebuffi, et.el., J. Synchrotron Radiat. 27: 1108-1120 (2020). [3]Z. Sun, et.al., The Innovation, 4 (6), 100514 (2023).
	Poster THPPP009 [1.853 MB]
DOI •	reference for this paper ※ doi:10.18429/JACoW-MEDSI2023-THPPP009
About •	Received ※ 25 October 2023 — Revised ※ 05 November 2023 — Accepted ※ 08 November 2023 — Issued ※ 09 January 2024
Cite •	reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)

Paper

Title

Page

TUOAM03

Progress of Beamlines Design and Key Technologies of Hefei Advanced Light Facility

X.W. Du, J. Chen, Z.K. Liu, Q.P. Wang, Z. Wang, S. Wei
USTC/NSRL, Hefei, Anhui, People’s Republic of China

A new synchrotron radiation light source, Hefei Advanced Light Facility (HALF), is under construction. This is the fourth-generation diffraction limited light source located in the low energy region. The storage ring energy is 2.2GeV, the circumference is about 480m, and the horizontal beam natural emittance is about 86.3pm.rad. Ten beamlines, including three coherent beamlines, will be built in the first phase. Due to the high coherence, high brightness and high resolution characteristics of diffraction limited light source, the beamline faces new challenges. This talk will present the progress of beamlines design and some key technology R&D of HALF.

Slides TUOAM03 [3.921 MB]

Cite •

reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)

TUPYP026

Influence of the Groove Curvature on the Spectral Resolution in a Varied-Line-Spacing Plane Grating Monochromator (VLS-PGM)

67

J. Du, X.W. Du, Q.P. Wang, Z. Wang
USTC/NSRL, Hefei, Anhui, People’s Republic of China

Diffraction-limited synchrotron radiation (DLSR) light source with smaller source size and emittance makes ultra-high spectral resolution beamline possible. Here, we report an undulator-based beamline optical design with ultra-high spectral resolution using a varied-line-spacing plane grating monochromator (VLS-PGM), which is a well-proven design for achieving ultra-high resolution in the soft X-ray band. A VLS plane grating with a central groove density of 2400 l/mm is utilized to cover the photon energy region of 250 ~ 2000eV. VLS gratings are generally fabricated using the holographic method, but the resulting grating grooves are two-dimensionally curved curves, which can affect the resolution of the monochromator. To analyse this effect, we first use a spherical wavefront and an aspherical wavefront to generate the fringes and optimized the recording parameters. We also present a method for calculating the groove curvature of holographic plane VLS grating grooves. Furthermore, the influence of grating groove curvature on beamline resolution is theoretically analysed based on the aberration theory of concave grating.

Poster TUPYP026 [0.480 MB]

DOI •

reference for this paper ※ doi:10.18429/JACoW-MEDSI2023-TUPYP026

About •

Received ※ 25 October 2023 — Revised ※ 03 November 2023 — Accepted ※ 04 November 2023 — Issued ※ 12 March 2024

Cite •

reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)

TUPYP027

A Subnanometer Linear Displacement Actuator

70

S.K. Jiang, X.W. Du, Q.P. Wang
USTC/NSRL, Hefei, Anhui, People’s Republic of China

With the development of synchrotron radiation technology, an actuator with sub-nanometer resolution, 100N driving force, and compatible with ultra-high vacuum environment is required. To achieve synchrotron radiation micro-nano focusing with adjustment resolution of sub-nanometer and high-precision rotation at the nano-arc level, most of the commercial piezoelectric actuators are difficult to meet the requirements of resolution and driving force at the same time. The flexure-based compound bridge-type hinge has the characteristic of amplifying or reducing the input displacement by a certain multiple, and can be used in an ultra-high vacuum environment. According to this characteristic, the bridge-type composite flexible hinge can be combined with commercial piezoelectric actuators, to design a new actuator with sub-nanometer resolution and a driving force of 100N. This poster mainly presents the principle of the new actuator, the design of the prototype and the preliminary test results of its resolution, stroke.

Poster TUPYP027 [3.140 MB]

DOI •

reference for this paper ※ doi:10.18429/JACoW-MEDSI2023-TUPYP027

About •

Received ※ 25 October 2023 — Revised ※ 04 November 2023 — Accepted ※ 09 November 2023 — Issued ※ 25 January 2024

Cite •

reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)

TUPYP030

The Design of High Stability Double Crystal Monochromator for HALF

76

Z.L. Xu, J. Chen, X.W. Du, Y. Peng, Q.P. Wang
USTC/NSRL, Hefei, Anhui, People’s Republic of China

HALF is a fourth-generation synchrotron light source with a number of state-of-the-art beamlines. Naturally, the new 4th generation machines, with their small emittances, start to bring higher stability performance requirements. In response to these problems, an concept of a high stability DCM (Double Crystal Monochromator) with angular range between 14 and 81 degrees (equivalent to 2 to 8 keV with Si(111)) has been developed at the National Synchrotron Radiation Laboratory. This poster gives an overview of the DCM prototype project including specifications, Mechanical design, heat load management and stability consideration.

Poster TUPYP030 [1.221 MB]

DOI •

reference for this paper ※ doi:10.18429/JACoW-MEDSI2023-TUPYP030

About •

Received ※ 25 October 2023 — Revised ※ 04 November 2023 — Accepted ※ 08 November 2023 — Issued ※ 24 January 2024

Cite •

reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)

TUPYP032

An Argon-Oxygen or Argon-Hydrogen Radio-Frequency Plasma Cleaning Device for Removing Carbon Contamination from Optical Surfaces

79

H.J. Yuan, X.W. Du, Q.P. Wang
USTC/NSRL, Hefei, Anhui, People’s Republic of China

Due to synchrotron radiation, carbon contamination on the surfaces of optical elements inside the beamlines, such as mirrors and gratings, remains an issue. Future beamline designs will select more optical element surface coating materials according to the specific needs, including gold, platinum, chromium, nickel, and aluminum, and a single cleaning method will not be able to adequately address the demands. We have studied the RF plasma cleaning of optical elements. After the argon/oxygen or argon/hydrogen gas mixture was injected into the chamber, glow discharge was carried out, and the carbon on the surface of the inert metal-coated optical element and oxidation-prone metal-coated optical element was removed by the oxidation or reduction reaction of radicals. In order to optimize the discharge parameters, it utilizes a differential mass spectrometry system and an optical emission spectrometer to monitor the cleaning process. This paper introduces the principles of the two cleaning methods as well as our existing cleaning device.

Poster TUPYP032 [2.493 MB]

DOI •

reference for this paper ※ doi:10.18429/JACoW-MEDSI2023-TUPYP032

About •

Received ※ 25 October 2023 — Revised ※ 04 November 2023 — Accepted ※ 08 November 2023 — Issued ※ 19 December 2023

Cite •

reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)

THPPP007

Optimizing Indirect Cooling of a High Accuracy Surface Plane Mirror in Plane-Grating Monochromator

280

J. Chen, X.W. Du, M.H. Lin, Q.P. Wang, Z. Wang
USTC/NSRL, Hefei, Anhui, People’s Republic of China

Funding: This work is supported by the Chinese Academy of Science (CAS) and the Anhui province government for key techniques R&D of Hefei Advanced Light Facility.
For the cooling of the plane mirror in VIA-PGMs (var-iable-included-angle plane-grating monochromators), the top-side indirect cooling based on water is preferred for its advantages, such as cheaper, easier to use, smart notches, etc, when compared to the internal cooling. But it also arises challenges to control the RMS residual slope error of the mirror, whose requirement is less than 100 nano-radian. This requirement is even hard to fulfill, when combined with 1) the asymmetry thermal defor-mation on the meridian of the footprint area during the energy scanning, 2) the high heat load deduced by the synchrotron light and 3) the no obvious effects of the classical optimizations, such as increasing footprint size, cooling efficiency or adding smart notches. An effective way was found after numerous attempts, which is to make the footprint area far from the mirror¿s edge to reduce the asymmetry of the thermal deformation except for leading to a longer mirror. This paper will illustrate how the asymmetry affects the mirror¿s residual slope error and then, focus on the relationship among the asymmetry of cooling and the distance to provide a ref-erence for optical cooling.

Poster THPPP007 [1.805 MB]

DOI •

reference for this paper ※ doi:10.18429/JACoW-MEDSI2023-THPPP007

About •

Received ※ 26 October 2023 — Revised ※ 06 November 2023 — Accepted ※ 08 November 2023 — Issued ※ 04 March 2024

Cite •

reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)

THPPP008

Optimization of Thermal Deformation of a Horizontally Deflecting High-Heat-Load Mirror Based on eInGa Bath Cooling

283

J. Chen, X.W. Du, M.H. Lin, Q.P. Wang, Z. Wang
USTC/NSRL, Hefei, Anhui, People’s Republic of China

Funding: This work is supported by the Chinese Academy of Science (CAS) and the Anhui province government for key techniques R&D of Hefei Advanced Light Facility.
The synchrotron facility are developing towards higher brightness, lower divergence, narrower pulse, higher stability, etc. Therefore, the requirements of the first mirror of the beamline, who bear high-heat-load, were upgraded, and the performances of the mirror will be affected easily by other factors, such as flow induced vibration, clamping force, etc. Indirect water cooling based on eInGa bath is regarded as an effective mean to solve these thorny problems in designing of the first mirror cooling. However, for the case a horizontal de-flection mirror, the unilateral cooling method is usually adopted, resulting in some changes in the structure of the mirror. In this paper, a first mirror horizontally deflect-ing in Hefei advanced light source (HALF) are taken as examples to introduce the optimization method to achieve ultra-low meridian slope error of the first hori-zontal deflection mirror. The results show that this opti-mization method provides a rapid design mean to design the cooling scheme of the horizontally deflecting mirror based on the eInGa bath.

Poster THPPP008 [2.901 MB]

DOI •

reference for this paper ※ doi:10.18429/JACoW-MEDSI2023-THPPP008

About •

Received ※ 01 November 2023 — Revised ※ 06 November 2023 — Accepted ※ 08 November 2023 — Issued ※ 26 February 2024

Cite •

reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)

THPPP009

The Heat Load Calculation in the Grating-Based Beamline at Hefei Advanced Light Facility (HALF)

287

Z. Wang, J. Chen, X.W. Du, D. Feng, Q.P. Wang
USTC/NSRL, Hefei, Anhui, People’s Republic of China

Funding: This work is supported by the Chinese Academy of Science (CAS) and the Anhui province government for key techniques R&D of Hefei diffraction limited light source.
For the 4th generation synchrotron radiation (SR) light source, the heat load causes severe thermal deformation on the beamline optics as the emittance is reaching at the physical limit. The precise calculation of heat load on the optical elements is important for the thermal analysis including cooling method and thermal deformation simulation. A heat load calculation code has been developed for grating based SR beamline optics, which consists of modules of SR source simulation, mirror reflectivity and grating efficiency. The calculation results has been checked with SRCalc results. This code has been used to calculate the heat load of the Test Beamline optics at Hefei Advanced Light Facility (HALF). The heat absorbed by the first three optical elements¿including a toroidal mirror, a plane mirror and a plane grating¿is calculated.
[1]R. Reininger. SRCalc (2001). Unpublished
[2]L. Rebuffi, et.el., J. Synchrotron Radiat. 27: 1108-1120 (2020).
[3]Z. Sun, et.al., The Innovation, 4 (6), 100514 (2023).

Poster THPPP009 [1.853 MB]

DOI •

reference for this paper ※ doi:10.18429/JACoW-MEDSI2023-THPPP009

About •

Received ※ 25 October 2023 — Revised ※ 05 November 2023 — Accepted ※ 08 November 2023 — Issued ※ 09 January 2024

Cite •

reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)