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BiBTeX citation export for TUPYP032: An Argon-Oxygen or Argon-Hydrogen Radio-Frequency Plasma Cleaning Device for Removing Carbon Contamination from Optical Surfaces

@inproceedings{yuan:medsi2023-tupyp032,
  author       = {H.J. Yuan and X.W. Du and Q.P. Wang},
  title        = {{An Argon-Oxygen or Argon-Hydrogen Radio-Frequency Plasma Cleaning Device for Removing Carbon Contamination from Optical Surfaces}},
% booktitle    = {Proc. MEDSI'23},
  booktitle    = {Proc. 12th Int. Conf. Mech. Eng. Design Synchrotron Radiat. Equip. Instrum. (MEDSI'23)},
  eventdate    = {2023-11-06/2023-11-10},
  pages        = {79--81},
  paper        = {TUPYP032},
  language     = {english},
  keywords     = {plasma, vacuum, synchrotron, radiation, experiment},
  venue        = {Beijing, China},
  series       = {International Conference on Mechanical Engineering Design of Synchrotron Radiation Equipment and Instrumentation},
  number       = {12},
  publisher    = {JACoW Publishing, Geneva, Switzerland},
  month        = {07},
  year         = {2024},
  issn         = {2673-5520},
  isbn         = {978-3-95450-250-9},
  doi          = {10.18429/JACoW-MEDSI2023-TUPYP032},
  url          = {https://jacow.org/medsi2023/papers/tupyp032.pdf},
  abstract     = {{Due to synchrotron radiation, carbon contamination on the surfaces of optical elements inside the beamlines, such as mirrors and gratings, remains an issue. Future beamline designs will select more optical element surface coating materials according to the specific needs, including gold, platinum, chromium, nickel, and aluminum, and a single cleaning method will not be able to adequately address the demands. We have studied the RF plasma cleaning of optical elements. After the argon/oxygen or argon/hydrogen gas mixture was injected into the chamber, glow discharge was carried out, and the carbon on the surface of the inert metal-coated optical element and oxidation-prone metal-coated optical element was removed by the oxidation or reduction reaction of radicals. In order to optimize the discharge parameters, it utilizes a differential mass spectrometry system and an optical emission spectrometer to monitor the cleaning process. This paper introduces the principles of the two cleaning methods as well as our existing cleaning device.}},
}