FEL2014 - List of Keywords (alignment)

Paper	Title	Other Keywords	Page
MOP028	Field Integral Measurement System and Optical Alignment System for HUST THz-FEL	undulator, FEL, electron, cavity	80
	B. Qin, Q.S. Chen, M. Fan, Q. Fu, T. Hu, X. Lei, K.F. Liu, X. Liu, P. Tan, Y.Q. Xiong, J. Yang, L. Yang HUST, Wuhan, People's Republic of China X. Liu, Z. Ouyang, Y.B. Wang Huazhong University of Science and Technology, State Key Laboratory of Advanced Electromagnetic Engineering and Technology,, Hubei, People's Republic of China Y.J. Pei USTC/NSRL, Hefei, Anhui, People's Republic of China
	A Free Electron Laser oscillator with radiation wavelength 50–100 μm is under construction in Huazhong University of Science and Technology (HUST). The linear polarization undulator with K=1.0-1.25 has been designed and manufactured by Kyma s.r.l., by using a pure permanent magnet scheme. Acceptance test bas been performed in Kyma factory with well controlled phase error and field integrals for all gaps. This paper introduces the development of an online field integrals measurement system for the undulator, using the stretched wire method. The design and considerations of the optical alignment system is described as well.

MOP040	General Strategy for the Commissioning of the ARAMIS Undulators with a 3 GeV Electron Beam	undulator, electron, quadrupole, photon	107
	M. Calvi, M. Aiba, M. Brügger, S. Danner, R. Ganter, R. Ischebeck, L. Patthey, T. Schietinger, T. Schmidt PSI, Villigen PSI, Switzerland
	The commissioning of the first SwissFEL undulator line (Aramis) is planned for the beginning of 2017. Each undulator is equipped with a 5-axis camshaft system to remotely adjust its position in the micrometer range and a gap drive system to set K-values between 0.1 and 1.8. In the following paper the beam-based alignment of the undulator with respect to the golden orbit, the definition of look-up tables for the local correction strategy (minimization of undulator field errors), the fine-tuning of the K-values as well as the setting of the phase shifters are addressed. When applicable both electron beam and light based methods are presented and compared.

MOP043	Magnetic Design of an Apple III Undulator for SwissFEL	undulator, vacuum, polarization, operation	116
	T. Schmidt, A. Anghel, P. Boehler, M. Brügger, M. Calvi, S. Danner, P. Huber, A. Keller, M. Locher PSI, Villigen PSI, Switzerland
	In the frame of the SwissFEL project a soft x-ray line is planned in the coming years to cover the wavelength between 0.7 and 7.0nm. Based on the good experience at the SLS storage ring with Apple undulator as source of variable polarized light, Apple III type undulators are also foreseen at the SwissFEL. In this paper the design of these devices is introduced and the preliminary magnetic configuration together with the optimization strategy is presented in details.

MOP047	A 200 μm-period Laser-driven Undulator	undulator, laser, electron, plasma	131
	F. Toufexis, T. Tang, S.G. Tantawi SLAC, Menlo Park, California, USA
	Funding: This project was funded by U.S. Department of Energy under Contract No. DE-AC02-76SF00515 and the DARPA AXiS program. To reduce the linac energy required for a given synchrotron radiation wavelength, and hence the size of the device, a smaller undulator period with sufficient field strength is needed. In this work, a microfabricated, laser-driven undulator with 200um undulator period is proposed. A TE wave that co-propagates with the electron beam is excited between two polysilicon thin films, having a gap of 16.5um. The mode that is excited is a deflecting mode and causes the electron beam to wiggle. The device is fabricated on a silicon wafer, using conventional silicon micromachining techniques. A single polysilicon thin film is supported on a silicon chip, which has a slit from the back to allow delivery of the laser beam. Two such chips are bonded together to form a 16.5um gap, within which the electron beam passes through. The final device has dimensions 1cm x 1cm x 1.1mm and has approximately 35 undulator periods. In this paper, the model, design, fabrication, and cold measurements of the device are reported.

THP012	Error Analysis for Linac Lattice of Hard X-ray FEL Line in PAL-XFEL*	emittance, linac, simulation, lattice	703
	H. Yang, J.H. Han, H.-S. Kang, I.S. Ko PAL, Pohang, Kyungbuk, Republic of Korea
	Funding: *This work was supported by MSIP, Korea. PAL-XFEL consists of the hard x-ray line for 0.06 – 1-nm FEL and the soft x-ray line for 1 – 10-nm FEL. The linac of hard x-ray line is designed to generate 10-GeV, 200-pC, and 3-kA electron beam. It consists of S-band accelerating columns, an X-band linearizer, three bunch compressors (BC). We conduct error simulation in order to evaluate the tolerances of machine parameters and alignments. First, the machine tolerances and beam jitter levels are calculated in the simulations with dynamic errors and we find out the optimized lattice to satisfy the target tolerance of machine. Second, we conduct simulations with misalignment. We quantify the emittance dilution by misalignments, especially those of BCs. In order to compensate the misalignments, the methods of beam correction like Beam Based Alignment (BBA) are presented and the effects of emittance improvements are calculated.
	Poster THP012 [0.736 MB]

Paper

Title

Other Keywords

Page

MOP028

Field Integral Measurement System and Optical Alignment System for HUST THz-FEL

undulator, FEL, electron, cavity

80

B. Qin, Q.S. Chen, M. Fan, Q. Fu, T. Hu, X. Lei, K.F. Liu, X. Liu, P. Tan, Y.Q. Xiong, J. Yang, L. Yang
HUST, Wuhan, People's Republic of China
X. Liu, Z. Ouyang, Y.B. Wang
Huazhong University of Science and Technology, State Key Laboratory of Advanced Electromagnetic Engineering and Technology,, Hubei, People's Republic of China
Y.J. Pei
USTC/NSRL, Hefei, Anhui, People's Republic of China

A Free Electron Laser oscillator with radiation wavelength 50–100 μm is under construction in Huazhong University of Science and Technology (HUST). The linear polarization undulator with K=1.0-1.25 has been designed and manufactured by Kyma s.r.l., by using a pure permanent magnet scheme. Acceptance test bas been performed in Kyma factory with well controlled phase error and field integrals for all gaps. This paper introduces the development of an online field integrals measurement system for the undulator, using the stretched wire method. The design and considerations of the optical alignment system is described as well.

MOP040

General Strategy for the Commissioning of the ARAMIS Undulators with a 3 GeV Electron Beam

undulator, electron, quadrupole, photon

107

M. Calvi, M. Aiba, M. Brügger, S. Danner, R. Ganter, R. Ischebeck, L. Patthey, T. Schietinger, T. Schmidt
PSI, Villigen PSI, Switzerland

The commissioning of the first SwissFEL undulator line (Aramis) is planned for the beginning of 2017. Each undulator is equipped with a 5-axis camshaft system to remotely adjust its position in the micrometer range and a gap drive system to set K-values between 0.1 and 1.8. In the following paper the beam-based alignment of the undulator with respect to the golden orbit, the definition of look-up tables for the local correction strategy (minimization of undulator field errors), the fine-tuning of the K-values as well as the setting of the phase shifters are addressed. When applicable both electron beam and light based methods are presented and compared.

MOP043

Magnetic Design of an Apple III Undulator for SwissFEL

undulator, vacuum, polarization, operation

116

T. Schmidt, A. Anghel, P. Boehler, M. Brügger, M. Calvi, S. Danner, P. Huber, A. Keller, M. Locher
PSI, Villigen PSI, Switzerland

In the frame of the SwissFEL project a soft x-ray line is planned in the coming years to cover the wavelength between 0.7 and 7.0nm. Based on the good experience at the SLS storage ring with Apple undulator as source of variable polarized light, Apple III type undulators are also foreseen at the SwissFEL. In this paper the design of these devices is introduced and the preliminary magnetic configuration together with the optimization strategy is presented in details.

MOP047

A 200 μm-period Laser-driven Undulator

undulator, laser, electron, plasma

131

F. Toufexis, T. Tang, S.G. Tantawi
SLAC, Menlo Park, California, USA

Funding: This project was funded by U.S. Department of Energy under Contract No. DE-AC02-76SF00515 and the DARPA AXiS program.
To reduce the linac energy required for a given synchrotron radiation wavelength, and hence the size of the device, a smaller undulator period with sufficient field strength is needed. In this work, a microfabricated, laser-driven undulator with 200um undulator period is proposed. A TE wave that co-propagates with the electron beam is excited between two polysilicon thin films, having a gap of 16.5um. The mode that is excited is a deflecting mode and causes the electron beam to wiggle. The device is fabricated on a silicon wafer, using conventional silicon micromachining techniques. A single polysilicon thin film is supported on a silicon chip, which has a slit from the back to allow delivery of the laser beam. Two such chips are bonded together to form a 16.5um gap, within which the electron beam passes through. The final device has dimensions 1cm x 1cm x 1.1mm and has approximately 35 undulator periods. In this paper, the model, design, fabrication, and cold measurements of the device are reported.

THP012

Error Analysis for Linac Lattice of Hard X-ray FEL Line in PAL-XFEL*

emittance, linac, simulation, lattice

703

H. Yang, J.H. Han, H.-S. Kang, I.S. Ko
PAL, Pohang, Kyungbuk, Republic of Korea

Funding: *This work was supported by MSIP, Korea.
PAL-XFEL consists of the hard x-ray line for 0.06 – 1-nm FEL and the soft x-ray line for 1 – 10-nm FEL. The linac of hard x-ray line is designed to generate 10-GeV, 200-pC, and 3-kA electron beam. It consists of S-band accelerating columns, an X-band linearizer, three bunch compressors (BC). We conduct error simulation in order to evaluate the tolerances of machine parameters and alignments. First, the machine tolerances and beam jitter levels are calculated in the simulations with dynamic errors and we find out the optimized lattice to satisfy the target tolerance of machine. Second, we conduct simulations with misalignment. We quantify the emittance dilution by misalignments, especially those of BCs. In order to compensate the misalignments, the methods of beam correction like Beam Based Alignment (BBA) are presented and the effects of emittance improvements are calculated.

Poster THP012 [0.736 MB]