SRF2017 - List of Authors (Williams, W.E.)

Paper	Title	Page
WEXA03	High-performance Thin-film Niobium Produced via Chemical Vapor Deposition (CVD)	674
	R.D. Porter, D.L. Hall, M. Liepe, J.T. Maniscalco Cornell University (CLASSE), Cornell Laboratory for Accelerator-Based Sciences and Education, Ithaca, New York, USA V.M. Arrieta, S.R. McNeal, W.E. Williams Ultramet, Pacoima, California, USA
	Bulk niobium cavities have been the standard for superconducting particle accelerators for many years. However, the cost of high RRR niobium start materials makes them expensive. The use of Chemical Vapor Deposition (CVD) processing technologies to produce thin Nb films on low-cost substrates (e.g. copper) offers a method to significantly reduce the cost of accelerator cavity fabrication while increasing cavity performance capabilities. Recent optimization of CVD niobium processes for high RRR Nb films has led to RF performance approaching that of bulk Nb. In collaboration with Ultramet, Cornell continues to explore the potential of CVD techniques. This paper presents results from a detailed study of CVD thin film Nb materials produced by Ultramet on 5-inch diameter copper and molybdenum substrates, including RF performance results with T-mapping and detailed surface analysis of performance limiting regions. Our work shows that CVD-based cavity fabrication methods are a promising alternative to sheet-formed bulk cavities, and to other thin Nb film techniques, warranting further development. Additional results from the field will be discussed.
	Slides WEXA03 [1.503 MB]
DOI •	reference for this paper ※ https://doi.org/10.18429/JACoW-SRF2017-WEXA03
Export •	reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)

Paper

Title

Page

High-performance Thin-film Niobium Produced via Chemical Vapor Deposition (CVD)

674

R.D. Porter, D.L. Hall, M. Liepe, J.T. Maniscalco
Cornell University (CLASSE), Cornell Laboratory for Accelerator-Based Sciences and Education, Ithaca, New York, USA
V.M. Arrieta, S.R. McNeal, W.E. Williams
Ultramet, Pacoima, California, USA

Bulk niobium cavities have been the standard for superconducting particle accelerators for many years. However, the cost of high RRR niobium start materials makes them expensive. The use of Chemical Vapor Deposition (CVD) processing technologies to produce thin Nb films on low-cost substrates (e.g. copper) offers a method to significantly reduce the cost of accelerator cavity fabrication while increasing cavity performance capabilities. Recent optimization of CVD niobium processes for high RRR Nb films has led to RF performance approaching that of bulk Nb. In collaboration with Ultramet, Cornell continues to explore the potential of CVD techniques. This paper presents results from a detailed study of CVD thin film Nb materials produced by Ultramet on 5-inch diameter copper and molybdenum substrates, including RF performance results with T-mapping and detailed surface analysis of performance limiting regions. Our work shows that CVD-based cavity fabrication methods are a promising alternative to sheet-formed bulk cavities, and to other thin Nb film techniques, warranting further development. Additional results from the field will be discussed.

Slides WEXA03 [1.503 MB]

DOI •

reference for this paper ※ https://doi.org/10.18429/JACoW-SRF2017-WEXA03

Export •

reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)