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RIS citation export for WEXA03: High-performance Thin-film Niobium Produced via Chemical Vapor Deposition (CVD)

TY - CONF
AU - Porter, R.D.
AU - Arrieta, V.M.
AU - Hall, D.L.
AU - Liepe, M.
AU - Maniscalco, J.T.
AU - McNeal, S.R.
AU - Williams, W.E.
ED - Schaa, Volker RW
ED - He, Yuan
ED - Li, Lu
ED - Zhao, Ning
TI - High-performance Thin-film Niobium Produced via Chemical Vapor Deposition (CVD)
J2 - Proc. of SRF2017, Lanzhou, China, July 17-21, 2017
C1 - Lanzhou, China
T2 - International Conference on RF Superconductivity
T3 - 18
LA - english
AB - Bulk niobium cavities have been the standard for superconducting particle accelerators for many years. However, the cost of high RRR niobium start materials makes them expensive. The use of Chemical Vapor Deposition (CVD) processing technologies to produce thin Nb films on low-cost substrates (e.g. copper) offers a method to significantly reduce the cost of accelerator cavity fabrication while increasing cavity performance capabilities. Recent optimization of CVD niobium processes for high RRR Nb films has led to RF performance approaching that of bulk Nb. In collaboration with Ultramet, Cornell continues to explore the potential of CVD techniques. This paper presents results from a detailed study of CVD thin film Nb materials produced by Ultramet on 5-inch diameter copper and molybdenum substrates, including RF performance results with T-mapping and detailed surface analysis of performance limiting regions. Our work shows that CVD-based cavity fabrication methods are a promising alternative to sheet-formed bulk cavities, and to other thin Nb film techniques, warranting further development. Additional results from the field will be discussed.
PB - JACoW
CP - Geneva, Switzerland
SP - 674
EP - 680
KW - niobium
KW - ion
KW - cavity
KW - SRF
KW - electron
DA - 2018/01
PY - 2018
SN - 978-3-95450-191-5
DO - 10.18429/JACoW-SRF2017-WEXA03
UR - http://jacow.org/srf2017/papers/wexa03.pdf
ER -