Author: Sato, Y.
Paper Title Page
WEOAM05
Zero-Length Conflat Flange Nonevaporable Getter (NEG) Pump Manufactured by Oxygen-Free Pd/Ti Deposition  
 
  • K. Mase, T. Kikuchi
    KEK, Tsukuba, Japan
  • S. Ohno
    Yokohama National University, Yokohama, Japan
  • M. Ono, I. Yoshikawa, K. Yoshioka
    University of Tokyo, Kashiwa, Japan
  • Y. Sato
    Yokohama National University, Graduate School of Engineering Science, Yokohama, Japan
 
  Funding: This work was supported by KAKENHI (JP17K05067, JP19K05280, 22K04937), TIA-Kakehashi grants (TK18-014, TK19-035) and Takahashi Industrial Economic Research Foundation research grant (08-003-172).
Nonevaporable getter (NEG) pumps are widely used to maintain ultrahigh vacuum (UHV). Commercial NEG pumps using ZrVFe alloy can be activated by heating at 400¿500 °C, and pump active residual gases such as H₂, H₂O, CO₂, CO, N₂, and so on at room temperature (RT).* Recently T. Miyazawa, T. Kikuchi, K. Mase et al. have developed a new NEG, Pd overcoated on Ti thin film with a purity higher than 99.95% (oxygen-free Pd/Ti hereafter), which pumps H₂ and CO at RT after baking at 133 °C for 12 hours.** Then we developed a zero-length conflat flange NEG pump deposited with oxygen-free Pd/Ti.*** The NEG pump can be fully activated by baking at 150 °C for 12 h and exhibits initial pumping speeds of 2340 L s¿1 for H₂, and 1440 L s¿1 for CO. The initial pumping speeds of the oxygen-free Pd/Ti thin film after baking at 150 °C were estimated to be 3.2 L s¿1 cm¿2 for H₂ and 7.6 L s¿1 cm¿2 for CO. The present NEG pump is ideal for maintaining UHV below 10¿8 Pa, because its pumping speeds for H₂ and CO are quite large, and because it can be fully activated by baking at 150 °C for 12 h.
*E. Maccallini et al., AIP Conf. Proc. 1451, 24 (2012).
**T. Miyazawa et al., J. Vac. Sci. Technol. A 36, 051601 (2018).
***Y. Sato et al., Vacuum 212, 112004 (2023).
 
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