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RIS citation export for WEOAM05: Zero-Length Conflat Flange Nonevaporable Getter (NEG) Pump Manufactured by Oxygen-Free Pd/Ti Deposition

TY  - UNPB
AU  - Mase, K.
AU  - Kikuchi, T.
AU  - Ohno, S.
AU  - Ono, M.
AU  - Sato, Y.
AU  - Yoshikawa, I.
AU  - Yoshioka, K.
ED  - Schaa, Volker R.W.
ED  - Bian, Lin
ED  - Chen, Zhichu
ED  - Dong, Yuhui
ED  - He, Ping
TI  - Zero-Length Conflat Flange Nonevaporable Getter (NEG) Pump Manufactured by Oxygen-Free Pd/Ti Deposition
J2  - Proc. of MEDSI2023, Beijing, China, 06-10 November 2023
CY  - Beijing, China
T2  - International Conference on Mechanical Engineering Design of Synchrotron Radiation Equipment and Instrumentation
T3  - 12
LA  - english
AB  - Nonevaporable getter (NEG) pumps are widely used to maintain ultrahigh vacuum (UHV). Commercial NEG pumps using ZrVFe alloy can be activated by heating at 400¿500 °C, and pump active residual gases such as H₂, H₂O, CO₂, CO, N₂, and so on at room temperature (RT). Recently T. Miyazawa, T. Kikuchi, K. Mase et al. have developed a new NEG, Pd overcoated on Ti thin film with a purity higher than 99.95\% (oxygen-free Pd/Ti hereafter), which pumps H₂ and CO at RT after baking at 133 °C for 12 hours. Then we developed a zero-length conflat flange NEG pump deposited with oxygen-free Pd/Ti. The NEG pump can be fully activated by baking at 150 °C for 12 h and exhibits initial pumping speeds of 2340 L s¿1 for H₂, and 1440 L s¿1 for CO. The initial pumping speeds of the oxygen-free Pd/Ti thin film after baking at 150 °C were estimated to be 3.2 L s¿1 cm¿2 for H₂ and 7.6 L s¿1 cm¿2 for CO. The present NEG pump is ideal for maintaining UHV below 10¿8 Pa, because its pumping speeds for H₂ and CO are quite large, and because it can be fully activated by baking at 150 °C for 12 h.
PB  - JACoW Publishing
CP  - Geneva, Switzerland
ER  -