Author: Ohno, S.
Paper Title Page
WEOAM05
Zero-Length Conflat Flange Nonevaporable Getter (NEG) Pump Manufactured by Oxygen-Free Pd/Ti Deposition  
 
  • K. Mase, T. Kikuchi
    KEK, Tsukuba, Japan
  • S. Ohno
    Yokohama National University, Yokohama, Japan
  • M. Ono, I. Yoshikawa, K. Yoshioka
    University of Tokyo, Kashiwa, Japan
  • Y. Sato
    Yokohama National University, Graduate School of Engineering Science, Yokohama, Japan
 
  Funding: This work was supported by KAKENHI (JP17K05067, JP19K05280, 22K04937), TIA-Kakehashi grants (TK18-014, TK19-035) and Takahashi Industrial Economic Research Foundation research grant (08-003-172).
Nonevap­orable get­ter (NEG) pumps are widely used to main­tain ul­tra­high vac­uum (UHV). Com­mer­cial NEG pumps using ZrVFe alloy can be ac­ti­vated by heat­ing at 400¿500 °C, and pump ac­tive resid­ual gases such as H₂, H₂O, CO₂, CO, N₂, and so on at room tem­per­a­ture (RT).* Re­cently T. Miyazawa, T. Kikuchi, K. Mase et al. have de­vel­oped a new NEG, Pd over­coated on Ti thin film with a pu­rity higher than 99.95% (oxy­gen-free Pd/Ti here­after), which pumps H₂ and CO at RT after bak­ing at 133 °C for 12 hours.** Then we de­vel­oped a zero-length con­flat flange NEG pump de­posited with oxy­gen-free Pd/Ti.*** The NEG pump can be fully ac­ti­vated by bak­ing at 150 °C for 12 h and ex­hibits ini­tial pump­ing speeds of 2340 L s¿1 for H₂, and 1440 L s¿1 for CO. The ini­tial pump­ing speeds of the oxy­gen-free Pd/Ti thin film after bak­ing at 150 °C were es­ti­mated to be 3.2 L s¿1 cm¿2 for H₂ and 7.6 L s¿1 cm¿2 for CO. The pre­sent NEG pump is ideal for main­tain­ing UHV below 10¿8 Pa, be­cause its pump­ing speeds for H₂ and CO are quite large, and be­cause it can be fully ac­ti­vated by bak­ing at 150 °C for 12 h.
*E. Maccallini et al., AIP Conf. Proc. 1451, 24 (2012).
**T. Miyazawa et al., J. Vac. Sci. Technol. A 36, 051601 (2018).
***Y. Sato et al., Vacuum 212, 112004 (2023).
 
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