Author: Chang, G.C.
Paper Title Page
TUOBM05 The Progress in Design, Preparation and Measurement of MLL for HEPS 24
 
  • S.P. Yue, G.C. Chang, Q. Hou, B. Ji, M. Li
    IHEP, Beijing, People’s Republic of China
 
  Funding: This work was supported by the National Natural Science Foundation of China (Project12005250¿
The mul­ti­layer Laue lens (MLL) is a promis­ing op­ti­cal el­e­ment with large nu­mer­i­cal aper­ture and as­pect ratio in syn­chro­tron ra­di­a­tion fa­cil­ity. Two mul­ti­lay­ers with 63(v)×43(h) ¿m2 aper­ture and focal spot size of 8.1(v)×8.1(h)nm2 at 10keV are fab­ri­cated by a 7-me­ter-long Laue lens de­po­si­tion ma­chine. Ul­tra­fast laser etch­ing, dic­ing and FIB are used to fab­ri­cate the mul­ti­layer into two-di­men­sional lenses meet­ing the re­quire­ment of dif­frac­tion dy­nam­ics. The mul­ti­layer grows flat with­out dis­tor­tion and shows an amor­phous struc­ture char­ac­ter­ized by TEM and SAED. The small­est ac­cu­mu­lated layer po­si­tion error is below ±5 nm in the whole area and the rms error is about 2.91nm by SEM and image pro­cess­ing. The fo­cus­ing per­for­mance of MLL with ac­tual film thick­ness is cal­cu­lated by a method based on the Tak­agi¿Taupin de­scrip­tion (TTD). The full width at half max­i­mum(FWHM) of focus spot is 8.2×8.4 nm2 which is close to the the­o­ret­i­cal re­sult.
 
slides icon Slides TUOBM05 [7.563 MB]  
DOI • reference for this paper ※ doi:10.18429/JACoW-MEDSI2023-TUOBM05  
About • Received ※ 24 October 2023 — Revised ※ 03 November 2023 — Accepted ※ 09 November 2023 — Issued ※ 18 May 2024
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WEOBM07 Design, Modeling and Analysis of a Novel Piezoactuated XY Nanopositioner Supporting Beamline Optical Scanning 150
 
  • L.F. Wang, G.C. Chang, S. Tang, Z.Y. Yue, L. Zhang
    IHEP, Beijing, People’s Republic of China
 
  In re­cent years, with the ad­vance­ment of X-ray op­tics tech­nol­ogy, the spot size of syn­chro­tron beam­lines has been re­duced to 10nm or even smaller. The re­duc­tion in spot size and the emer­gence of ul­tra-bright syn­chro­tron sources ne­ces­si­tate higher sta­bil­ity, res­o­lu­tion, and faster scan­ning speeds for po­si­tion­ing sys­tems. This paper pre­sents the de­sign, analy­sis, and sim­u­la­tion of an XY piezo­elec­tric dri­ven nanopo­si­tion­ing plat­form that sup­ports high-pre­ci­sion op­ti­cal scan­ning sys­tems. To achieve fast and highly pre­cise mo­tion under the load of an op­ti­cal sys­tem, a de­sign scheme based on a hol­low struc­ture with flex­i­ble am­pli­fi­ca­tion and guid­ing mech­a­nisms is pro­posed. This scheme in­creases dis­place­ment out­put while min­i­miz­ing cou­pling dis­place­ment to en­sure a high nat­ural fre­quency. The ra­tio­nal­ity of this plat­form de­sign is ver­i­fied through mod­el­ing and fi­nite el­e­ment sim­u­la­tion.  
slides icon Slides WEOBM07 [3.448 MB]  
DOI • reference for this paper ※ doi:10.18429/JACoW-MEDSI2023-WEOBM07  
About • Received ※ 02 November 2023 — Revised ※ 03 November 2023 — Accepted ※ 04 November 2023 — Issued ※ 18 April 2024
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WEPPP019 Coating Removal of Silicon-Based Mirror in Synchrotron Radiation by Soluble Underlayers 181
 
  • Q. Hou, G.C. Chang, B. Ji, M. Li, S.P. Yue
    IHEP, People’s Republic of China
 
  Mul­ti­layer op­tics is widely used for the x-ray beam mono­chrom­a­ti­za­tion, fo­cus­ing, and col­li­ma­tion in syn­chro­tron light source. How­ever, the mul­ti­layer coat­ings might be dam­aged by the high heat loads, the poor film ad­he­sion, the high in­ter­nal stress, or the in­ad­e­quate vac­uum con­di­tions. As a re­sult, it is es­sen­tial to de­velop a method to make the op­ti­cal sub­strate reusable with­out com­pro­mis­ing its qual­ity. In our pub­lished work, we suc­cess­fully pre­pared a W/B4C mul­ti­layer coat­ing with a 2 nm Cr buffer layer on a small-sized Si wafer. The coat­ing was stripped from the Si sub­strate by dis­solv­ing the Cr buffer layer using an etchant. After the etch­ing process, the sam­ple’s rough­ness was com­pa­ra­ble to that of a brand-new sub­strate. We have since uti­lized this method to clean the mul­ti­lay­ers on the sur­face of a 20 cm × 5 cm sil­i­con-based mir­ror for High En­ergy Pho­ton Source (HEPS). The sur­face rough­ness and shape were mea­sured, and they reached the level of a brand-new mir­ror.  
DOI • reference for this paper ※ doi:10.18429/JACoW-MEDSI2023-WEPPP019  
About • Received ※ 02 November 2023 — Revised ※ 04 November 2023 — Accepted ※ 06 November 2023 — Issued ※ 19 December 2023
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