LINAC2016 - List of Keywords (ECRIS)

Paper	Title	Other Keywords	Page
TUPRC032	An Analysis of Fast Sputtering Studies for Ion Confinement Time	ion, plasma, electron, ion-source	475
	D.E. Neben, G. Machicoane, A.N. Pham, J.W. Stetson NSCL, East Lansing, Michigan, USA G. Machicoane FRIB, East Lansing, USA G. Parsey MSU, East Lansing, Michigan, USA J.P. Verboncoeur Michigan State University, East Lansing, Michigan, USA
	Funding: This work was supported by Michigan State University and the National Science Foundation: NSF Award Number PHY-1415462 Existing heavy ion facilities such as the National Superconducting Cyclotron Laboratory at Michigan State University rely on Electron Cyclotron Resonance (ECR) ion sources as injectors of highly charged ion beams. Long ion confinement times are necessary to produce dense populations of highly charged ions because of steadily decreasing ionization cross sections with increasing charge state. To further understand ion extraction and confinement we are using a fast sputtering technique first developed at Argonne National Laboratory (ANL) [1] to introduce a small amount of uranium metal into the plasma at a well-defined time. We present an analytical solution to the coupled ion density rate equations for using a piecewise constant neutral density to interpret the fast sputtering method. *R. Vondrasek et al., Rev. Sci. Instrum. 73, 548-551 (2002).
	Poster TUPRC032 [0.699 MB]
DOI •	reference for this paper ※ https://doi.org/10.18429/JACoW-LINAC2016-TUPRC032
Export •	reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)

FR1A03	Intense Beam Production of Highly Charged Ions by the Superconducting ECR Ion Source SECRAL for Heavy Ion Linacs	ion, ion-source, ECR, linac	1027
	L.T. Sun, X. Fang, Y.C. Feng, J.W. Guo, W. Lu, L.Z. Ma, C. Qian, Z. Shen, W. Wu, Y. Yang, W.H. Zhang, X.Z. Zhang, H.W. Zhao, L. Zhu IMP/CAS, Lanzhou, People's Republic of China
	Superconducting ECR ion source (SC-ECRIS) represents the state of the art technologies of ECR ion sources. Existing SC-ECRISs developed in different labs have contributed significantly for ECRIS technology advancement in the last 15 years. Recently the superconducting ECR ion source SECRAL operated at 24 GHz at IMP has produced many new world recorded beam intensities of highly charged ions due to new technologies applied, such as a new microwave coupling scheme. At the meantime, the world first 4th generation ECR ion source operated at 45 GHz is being developed at IMP. All these developments on intense beam production of highly charged ions with superconducting ECR ion source may play significant roles for the next generation heavy ion linacs such as FRIB and Linac of HIAF project. This paper will report the recent developments of intense highly charged heavy ion beams at IMP and the discussion on perspectives of next generation ECRIS for the future heavy ion liancs.
	Slides FR1A03 [13.557 MB]
DOI •	reference for this paper ※ https://doi.org/10.18429/JACoW-LINAC2016-FR1A03
Export •	reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)

Paper

Title

Other Keywords

Page

TUPRC032

An Analysis of Fast Sputtering Studies for Ion Confinement Time

ion, plasma, electron, ion-source

475

D.E. Neben, G. Machicoane, A.N. Pham, J.W. Stetson
NSCL, East Lansing, Michigan, USA
G. Machicoane
FRIB, East Lansing, USA
G. Parsey
MSU, East Lansing, Michigan, USA
J.P. Verboncoeur
Michigan State University, East Lansing, Michigan, USA

Funding: This work was supported by Michigan State University and the National Science Foundation: NSF Award Number PHY-1415462
Existing heavy ion facilities such as the National Superconducting Cyclotron Laboratory at Michigan State University rely on Electron Cyclotron Resonance (ECR) ion sources as injectors of highly charged ion beams. Long ion confinement times are necessary to produce dense populations of highly charged ions because of steadily decreasing ionization cross sections with increasing charge state. To further understand ion extraction and confinement we are using a fast sputtering technique first developed at Argonne National Laboratory (ANL) [1] to introduce a small amount of uranium metal into the plasma at a well-defined time. We present an analytical solution to the coupled ion density rate equations for using a piecewise constant neutral density to interpret the fast sputtering method.
*R. Vondrasek et al., Rev. Sci. Instrum. 73, 548-551 (2002).

Poster TUPRC032 [0.699 MB]

DOI •

reference for this paper ※ https://doi.org/10.18429/JACoW-LINAC2016-TUPRC032

Export •

reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)

FR1A03

Intense Beam Production of Highly Charged Ions by the Superconducting ECR Ion Source SECRAL for Heavy Ion Linacs

ion, ion-source, ECR, linac

1027

L.T. Sun, X. Fang, Y.C. Feng, J.W. Guo, W. Lu, L.Z. Ma, C. Qian, Z. Shen, W. Wu, Y. Yang, W.H. Zhang, X.Z. Zhang, H.W. Zhao, L. Zhu
IMP/CAS, Lanzhou, People's Republic of China

Superconducting ECR ion source (SC-ECRIS) represents the state of the art technologies of ECR ion sources. Existing SC-ECRISs developed in different labs have contributed significantly for ECRIS technology advancement in the last 15 years. Recently the superconducting ECR ion source SECRAL operated at 24 GHz at IMP has produced many new world recorded beam intensities of highly charged ions due to new technologies applied, such as a new microwave coupling scheme. At the meantime, the world first 4th generation ECR ion source operated at 45 GHz is being developed at IMP. All these developments on intense beam production of highly charged ions with superconducting ECR ion source may play significant roles for the next generation heavy ion linacs such as FRIB and Linac of HIAF project. This paper will report the recent developments of intense highly charged heavy ion beams at IMP and the discussion on perspectives of next generation ECRIS for the future heavy ion liancs.

Slides FR1A03 [13.557 MB]

DOI •

reference for this paper ※ https://doi.org/10.18429/JACoW-LINAC2016-FR1A03

Export •

reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)