MOYGB1
LBNL, Berkeley, California, USA
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MOYGB1 |
Industrial Applications of Free Electron Lasers: Extreme Ultraviolet Lithography | |
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| EUV lithography (EUVL) is recognized as a critical path technology for the next generation of high volume semiconductor manufacturing. Long term, EUVL source power requirements approach and even exceed 1kW of average power. Accelerator driven free electron laser (FEL) technology has emerged a promising technology to meet this need. This talk should be an overview of EUVL, and summarize the basic requirements for EUVL sources including factors driving potential future power scaling needs. | ||
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Slides MOYGB1 [2.190 MB] | |
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