The Joint Accelerator Conferences Website (JACoW) is an international collaboration that publishes the proceedings of accelerator conferences held around the world.
TY - UNPB AU - Naulleau, P. ED - Henderson, Stuart ED - Akers, Evelyn ED - Satogata, Todd ED - Schaa, Volker R.W. TI - Industrial Applications of Free Electron Lasers: Extreme Ultraviolet Lithography J2 - Proc. of IPAC2015, Richmond, VA, USA, May 3-8, 2015 C1 - Richmond, VA, USA T2 - International Particle Accelerator Conference T3 - 6 LA - english AB - EUV lithography (EUVL) is recognized as a critical path technology for the next generation of high volume semiconductor manufacturing. Long term, EUVL source power requirements approach and even exceed 1kW of average power. Accelerator driven free electron laser (FEL) technology has emerged a promising technology to meet this need. This talk should be an overview of EUVL, and summarize the basic requirements for EUVL sources including factors driving potential future power scaling needs. PB - JACoW CP - Geneva, Switzerland ER -