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WEPPP042 |
Application of Surface-Partially Nitrided High-Purity Ti as a Nonevaporable Getter for Synchrotron Radiation Beamline | |
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Funding: This work was partly supported by KAKENHI (JP17K05067, JP19K05280, 22K04937) TIA-Kakehashi (TK20-026, TK21-046, TK22-053) and Takahashi Industrial Economic Research Foundation (08-003-172). Nonevaporable getter (NEG) pumps are widely used in synchrotron radiation facilities because they are oil-free, vibration-free, space-saving, lightweight, and energy-saving. When a NEG thin film is deposited on the inner wall of a vacuum duct, the residual active gases are pumped after baking. Recently we have developed a new NEG thin film that was prepared by the following simple procedure, sublimation of high-purity Ti under UHV in the range of 10-7 to 10-8 Pa, followed by N₂ introduction.*,** We confirmed that partially nitrided high-purity Ti coating on inner surface of a vacuum vessel pumped H₂, H₂O, O₂ gases, and CO even after 30 cycles of pumping, baking at 185 °C for 6 hours, cooling down to room temperature, introduction of high-purity N₂, and exposure to air.** In the present study, we applied surface-partially nitrided high-purity Ti on the inner surface of the vacuum ducts in the upstream section of BL-12C in the Photon Factory 2.5 GeV ring and baked them at 250°C. Pressure in the section reached ultrahigh vacuum of 2.2×10-8 Pa without ion pumps after isolation from the turbomolecular pump with gate valve. * T. Miyazawa et al., Vac. Surf. Sci. 61, 227 (2018). ** K. Mase, et al., MEDSI2020 Proceedings, TUPA01 (2021) |
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