Author: Li, C.
Paper Title Page
WEPAB067 High Duty Cycle EUV Radiation Source Based on Inverse Compton Scattering 2748
 
  • R. Huang, Q.K. Jia, C. Li
    USTC/NSRL, Hefei, Anhui, People’s Republic of China
 
  Funding: Work supported by the National Natural Science Foundation of China Grant Number 11805200, and National Key Research and Development Program of China No. 2016YFA0401901.
ICS can obtain quasi-monochromatic and directional EUV radiation via a MeV-scale energy electron beam and a micron-scale wavelength laser beam, which enables a dramatic reduction in dimension and expense of the system, and makes it an attractive technology in research, industry, medicine and homeland security. Here we describe an EUV source based on high repetition ICS system. The scheme exploits the output from the laser-electron interaction between a MW-ps laser at MHz repetition-rate and a high quality electron beam with an energy of a few MeV at MHz repetition-rate.
 
poster icon Poster WEPAB067 [1.551 MB]  
DOI • reference for this paper ※ https://doi.org/10.18429/JACoW-IPAC2021-WEPAB067  
About • paper received ※ 23 May 2021       paper accepted ※ 24 June 2021       issue date ※ 02 September 2021  
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