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@inproceedings{huang:ipac2021-wepab067,
author = {R. Huang and Q.K. Jia and C. Li},
title = {{High Duty Cycle EUV Radiation Source Based on Inverse Compton Scattering}},
booktitle = {Proc. IPAC'21},
pages = {2748--2750},
eid = {WEPAB067},
language = {english},
keywords = {laser, electron, gun, photon, emittance},
venue = {Campinas, SP, Brazil},
series = {International Particle Accelerator Conference},
number = {12},
publisher = {JACoW Publishing, Geneva, Switzerland},
month = {08},
year = {2021},
issn = {2673-5490},
isbn = {978-3-95450-214-1},
doi = {10.18429/JACoW-IPAC2021-WEPAB067},
url = {https://jacow.org/ipac2021/papers/wepab067.pdf},
note = {https://doi.org/10.18429/JACoW-IPAC2021-WEPAB067},
abstract = {{ICS can obtain quasi-monochromatic and directional EUV radiation via a MeV-scale energy electron beam and a micron-scale wavelength laser beam, which enables a dramatic reduction in dimension and expense of the system, and makes it an attractive technology in research, industry, medicine and homeland security. Here we describe an EUV source based on high repetition ICS system. The scheme exploits the output from the laser-electron interaction between a MW-ps laser at MHz repetition-rate and a high quality electron beam with an energy of a few MeV at MHz repetition-rate.}},
}