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RIS citation export for WEPAB067: High Duty Cycle EUV Radiation Source Based on Inverse Compton Scattering

TY  - CONF
AU  - Huang, R.
AU  - Jia, Q.K.
AU  - Li, C.
ED  - Liu, Lin
ED  - Byrd, John M.
ED  - Neuenschwander, Regis T.
ED  - Picoreti, Renan
ED  - Schaa, Volker R. W.
TI  - High Duty Cycle EUV Radiation Source Based on Inverse Compton Scattering
J2  - Proc. of IPAC2021, Campinas, SP, Brazil, 24-28 May 2021
CY  - Campinas, SP, Brazil
T2  - International Particle Accelerator Conference
T3  - 12
LA  - english
AB  - ICS can obtain quasi-monochromatic and directional EUV radiation via a MeV-scale energy electron beam and a micron-scale wavelength laser beam, which enables a dramatic reduction in dimension and expense of the system, and makes it an attractive technology in research, industry, medicine and homeland security. Here we describe an EUV source based on high repetition ICS system. The scheme exploits the output from the laser-electron interaction between a MW-ps laser at MHz repetition-rate and a high quality electron beam with an energy of a few MeV at MHz repetition-rate.
PB  - JACoW Publishing
CP  - Geneva, Switzerland
SP  - 2748
EP  - 2750
KW  - laser
KW  - electron
KW  - gun
KW  - photon
KW  - emittance
DA  - 2021/08
PY  - 2021
SN  - 2673-5490
SN  - 978-3-95450-214-1
DO  - doi:10.18429/JACoW-IPAC2021-WEPAB067
UR  - https://jacow.org/ipac2021/papers/wepab067.pdf
ER  -