Author: Kato, R.
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MOPVA018 Resonant Coherent Diffraction Radiation System at ERL Test Accelerator in KEK 887
 
  • Y. Honda, A. Aryshev, R. Kato, T. Miyajima, T. Obina, M. Shimada, R. Takai, N. Yamamoto
    KEK, Ibaraki, Japan
 
  Funding: This work was supported by JSPS KAKENHI Grant Number 16H05991
An Energy Recovery Linac can produce a low emittance and short bunch beam at a high repetition rate. A test accelerator, compact-ERL, has been operating in KEK for development works of technologies related to ERL and CW-Superconducting accelerators. In a special beam operation mode of bunch compression, a short bunch beam of ~150 fs at the repetition rate of CW 1.3 GHz can be realized in the return-loop. One of the promising applications of such a short bunch beam is a high power THz radiation source produced by a coherent radiation. When a charged particle beam passes close to a conductive target, a radiation called diffraction radiation is produced. If the target mirrors form an optical cavity which fundamental frequency matches the repetition frequency of the beam, the radiation resonates in the cavity, resulting in extracting a huge radiation power determined by the loss of the cavity. We plan to perform an experiment of the resonant coherent diffraction mechanism in the return-loop of the compact-ERL to test the feasibility to be a wide band high power THz source. We report the design of the experimental setup to be installed in the summer of 2017.
 
DOI • reference for this paper ※ https://doi.org/10.18429/JACoW-IPAC2017-MOPVA018  
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MOPVA019 60 pC Bunch Charge Operation of the Compact ERL at KEK 890
 
  • T. Miyajima, K. Harada, Y. Honda, E. Kako, R. Kato, T. Miura, N. Nakamura, T. Obina, M. Shimada, R. Takai, K. Umemori, M. Yamamoto
    KEK, Ibaraki, Japan
  • R. Hajima, R. Nagai
    QST, Tokai, Japan
  • T. Hotei
    Sokendai, Ibaraki, Japan
  • N. Nishimori
    Tohoku University, Research Center for Electron Photon Science, Sendai, Japan
 
  The compact ERL (cERL) at KEK was operated in March 2017 to demonstrate generation, acceleration and transportation of the target bunch charge of 60 pC without energy recovery. However, the maximum bunch charge was limited to 40 pC due to the limitation of the excitation laser power. For the bunch charge of 40 pC, the bunch length and the normalized emittance were measured in the injector diagnostic line. The results of the bunch length measurement gave good agreement with the values that had been obtained by model simulation. The measured normalized rms emittances for 40 pC were 0.9 to 2.4 mm mrad, and they were lager than the design value of 0.6 mm mrad. To achieve the design emittance, we have studied the source of the emittance growth for the bunch charge of 40 pC.  
DOI • reference for this paper ※ https://doi.org/10.18429/JACoW-IPAC2017-MOPVA019  
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MOPVA020 S2E Simulation of an ERL-Based High-Power EUV-FEL Source for Lithography 894
 
  • N. Nakamura, R. Kato, T. Miyajima, M. Shimada
    KEK, Ibaraki, Japan
  • R. Hajima
    QST, Tokai, Japan
  • T. Hotei
    Sokendai, Ibaraki, Japan
 
  An energy recovery linac(ERL)-based free electron laser(FEL) is a possible candidate of a high-power EUV source for lithography. The ERL can provide a high-current and high-quality electron beam for the high-power FEL and also greatly reduce the dumped beam power and activation compared to ordinary linacs. An ERL-based EUV-FEL source has been designed using available technologies and resources*. For this design, we perform Start-to-End(S2E) simulation from the electron gun to the exit of the decelerating main linac to track the electron beam parameters and to evaluate the FEL performance. The electron bunches from the injector are off-crest accelerated to 800 MeV and compressed in the 1st arc and/or chicane to obtain a high-peak current for high FEL output. After the undulator section for SASE FEL, they are decompressed in the 2nd arc and then decelerated in the main linac to optimize the energy spread or the energy recovery efficiency. This paper will present the S2E simulation for the designed EUV-FEL source.
* N. Nakamura et al., Proc. of ERL2015, Stony Brook, NY, USA, pp.4-9.
 
DOI • reference for this paper ※ https://doi.org/10.18429/JACoW-IPAC2017-MOPVA020  
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MOPVA021 Optics Design of the Compact ERL Injector for 60 pC Bunch Charge Operation 898
 
  • T. Hotei
    Sokendai, Ibaraki, Japan
  • R. Kato, T. Miyajima, N. Nakamura, M. Shimada
    KEK, Ibaraki, Japan
 
  EUV-FEL light source based on ERL has been designed at KEK for EUV lithography light source. The advantage of ERL is to accelerate high average current beam due to CW operation, and it is possible to drive high average power FEL. To generate the target EUV-FEL power, which is 10 kW, the bunch charge of 60 pC, the beam energy of 10.5 MeV and the bunch length of 1 ps are required at the end of the EUV-FEL injector. In order to demonstrate the target beam performance for the EUV-FEL accelerator, a high charge beam test was carried out at the cERL in KEK. We designed a new optics of the cERL injector prior to the high charge beam operation. To calculate beam dynamics more accurately, accelerator models corrected according to the condition of the actual cERL injector is used for the optics design. From results of the optics design that minimized the emittance and bunch length using the corrected accelerator models, the emittance and bunch length at the end of injector are 0.8 mm-mrad and 3.4 ps. Furthermore, based on the design optics, we carried out high bunch charge beam operation.  
DOI • reference for this paper ※ https://doi.org/10.18429/JACoW-IPAC2017-MOPVA021  
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TUPAB055 Development of compact magnetic field measurement system available for in-vacuum undulators 1449
 
  • M. Adachi, R. Kato, T. Shioya, K. Tsuchiya
    KEK, Ibaraki, Japan
 
  A low-emittance 3-GeV KEK-LS* ring has been designed at KEK. KEK-LS's undulators can produce extremely high brightness light ranging from VUV to X-ray. Brightness of undulator light strongly depends on the phase error of its periodic magnetic field. Then a precise magnetic field adjustment is required in order to prevent the reduction of the brightness performance. Generally, the adjustment is performed by the conventional field measurement system equipped with hole-probes on a huge stone table. But, for the in-vacuum undulator, the measurement must be performed without the vacuum chamber. The additional phase error caused by reattaching the chamber is not negligible for the low emittance rings. Therefore, some groups have developed measurement systems available for the direct field measurement inside the chamber**,***. We have started to develop a compact measurement system. Our system is compacted and stabilized by utilizing the rigid metal beam of the undulator frame instead of the stone table. In the conference, we will report the detail of the system and the present status of the development.
* KEK-LS HP, http://kekls.kek.jp/
** T. Tanaka, et al., Physical Review ST-AB, vol.12, p.120702 (2009).
*** M. Musardo, et al., Proceedings of IPAC2015, Richmond, VA, USA, p.1693 (2015).
 
DOI • reference for this paper ※ https://doi.org/10.18429/JACoW-IPAC2017-TUPAB055  
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