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TY - CONF AU - Hotei, T. AU - Kato, R. AU - Miyajima, T. AU - Nakamura, N. AU - Shimada, M. ED - Schaa, Volker RW ED - Arduini, Gianluigi ED - Pranke, Juliana ED - Seidel, Mike ED - Lindroos, Mats TI - Optics Design of the Compact ERL Injector for 60 pC Bunch Charge Operation J2 - Proc. of IPAC2017, Copenhagen, Denmark, 14â19 May, 2017 C1 - Copenhagen, Denmark T2 - International Particle Accelerator Conference T3 - 8 LA - english AB - EUV-FEL light source based on ERL has been designed at KEK for EUV lithography light source. The advantage of ERL is to accelerate high average current beam due to CW operation, and it is possible to drive high average power FEL. To generate the target EUV-FEL power, which is 10 kW, the bunch charge of 60 pC, the beam energy of 10.5 MeV and the bunch length of 1 ps are required at the end of the EUV-FEL injector. In order to demonstrate the target beam performance for the EUV-FEL accelerator, a high charge beam test was carried out at the cERL in KEK. We designed a new optics of the cERL injector prior to the high charge beam operation. To calculate beam dynamics more accurately, accelerator models corrected according to the condition of the actual cERL injector is used for the optics design. From results of the optics design that minimized the emittance and bunch length using the corrected accelerator models, the emittance and bunch length at the end of injector are 0.8 mm-mrad and 3.4 ps. Furthermore, based on the design optics, we carried out high bunch charge beam operation. PB - JACoW CP - Geneva, Switzerland SP - 898 EP - 901 KW - optics KW - cathode KW - laser KW - operation KW - gun DA - 2017/05 PY - 2017 SN - 978-3-95450-182-3 DO - 10.18429/JACoW-IPAC2017-MOPVA021 UR - http://jacow.org/ipac2017/papers/mopva021.pdf ER -