Author: Gulliford, C.M.
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MOPIK023 Cornell Laboratory for High Intensity, Ultra-Bright and Polarized Electron Beams 551
 
  • L. Cultrera, A.C. Bartnik, I.V. Bazarov, C.M. Gulliford, P. Gupta, H. Lee, S.A. McBride, T.P. Moore
    Cornell University (CLASSE), Cornell Laboratory for Accelerator-Based Sciences and Education, Ithaca, New York, USA
 
  Funding: This work has been funded by the National Science Foundation (Grant No. PHY-1416318) and Department of Energy (Grants No. DE-SC0014338, No. DE-SC0011643 and No. DE-SC0016203).
We report on the current activities pursued at Cornell University for the production of electron beams tailored to a wide range of applications. We have developed the expertise to grow many different type of high quantum efficiency photocathode belonging to the alkali antimonide family. Those materials are ideal candidates to produce high intensity beam with average currents in the mA range. When operated near threshold at cryogenic temperature in transmission mode they can also generate the electron beams needed to perform ultrafast electron diffraction of bio molecules. We have recently expanded our facility with a Mott polarimeter to include the capability to measure polarization of the electron beam. The photocathode lab is being complemented by a dedicated photo-gun laboratory to test the photocathode properties in a real environment and to perform measurement of the beam properties under new and yet unexplored operating conditions.
 
DOI • reference for this paper ※ https://doi.org/10.18429/JACoW-IPAC2017-MOPIK023  
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TUPAB126 Multi-objective Genetic Optimization of Single Shot Ultrafast Electron Diffraction Beamlines 1615
 
  • C.M. Gulliford, A.C. Bartnik, I.V. Bazarov
    Cornell University (CLASSE), Cornell Laboratory for Accelerator-Based Sciences and Education, Ithaca, New York, USA
  • J.M. Maxson
    UCLA, Los Angeles, California, USA
 
  We present the results of multi-objective genetic algorithm optimizations of two single-shot ultrafast electron diffraction (UED) beam lines. The first is based on a 225 kV dc gun featuring a novel cryocooled photocathode system and buncher cavity. The second uses a 100 MV/m 1.6 cell normal conducting rf (NCRF) gun, as well as a 9 cell 2 Pi/3 bunching cavity placed between two solenoids. Optimizations of the transverse projected emittance as a function of bunch charge are presented and discussed in terms of the scaling laws derived in the charge saturation limit. Additionally, optimization of the transverse coherence length as a function of final rms bunch length at the sample location have been performed. These results demonstrate the viability of the approaches taken for both beamlines studied as well as the use of using genetic algorithms in the design and operation of UED beamlines.  
DOI • reference for this paper ※ https://doi.org/10.18429/JACoW-IPAC2017-TUPAB126  
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TUPAB128 Single Photoemitter Tips in a DC Gun: Limiting Aberration-induced Emittance 1622
 
  • I.V. Bazarov, L. Cultrera, C.M. Gulliford, H. Lee
    Cornell University (CLASSE), Cornell Laboratory for Accelerator-Based Sciences and Education, Ithaca, New York, USA
  • H.K. Fung
    Cornell University, Ithaca, New York, USA
  • J.M. Maxson
    UCLA, Los Angeles, California, USA
 
  Ultrafast electron diffraction (UED) offers unique advantages over x-ray diffraction, like stronger scattering cross-section, versatility in sample types and ability to offer smaller apparatus foot print. There is a growing need to increase brightness of electron beams especially for single-shot UED applications. We explore the utilization of field enhancement from a micron-scale single tip inside a DC gun to obtain brighter sub-pC electron beams using a nominal cathode electric field of several MV/m. The additional field enhancement can place moderate voltage sources on par with the highest gradient devices and allow improved performance presently not possible in the existing photoemission guns.  
DOI • reference for this paper ※ https://doi.org/10.18429/JACoW-IPAC2017-TUPAB128  
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