CEA/IRFU, Gif-sur-Yvette, France
CEA/DRF/IRFU, Gif-sur-Yvette, France
This source developed at Saclay is under patent number FR 15 56871 and this patent is pending
| Paper | Title | Other Keywords | Page |
|---|---|---|---|
| WECO02 | Development of a Compact High Intensity Ion Source for Light Ions at CEA-Saclay | ion, extraction, plasma, high-voltage | 73 |
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During the past 5 years, a R&D program has been launched to improve the beam quality of ECR 2.45 GHz high intensity light ion sources for high power accelerators. The main goal was to minimize the divergence and emittance growth of intense beams due to the space charge as early as possible on the low energy transfer line for a better injection in the second stage of acceleration (RFQ). This has been achieved by reducing the length of the extraction system, to be able to put the first solenoid as close as possible to the extraction aperture. This was performed with the ALISES concept (Advanced Light Ion Source Extraction System). Encouraging results have been obtained in 2012 but with limitations due to Penning discharges in the accelerating column. Taking advantages of ALISES geometry, intensive studies and simulations have been undertaken to eliminate the discharge phenomena. An Innovative and compact source geometry has been found and the source has been fabricated. This new prototype and its performances will be described, as well as magnetic field configuration studies and its influence on the extracted beam.
This source developed at Saclay is under patent number FR 15 56871 and this patent is pending |
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Slides WECO02 [35.894 MB] | ||
| DOI • | reference for this paper ※ https://doi.org/10.18429/JACoW-ECRIS2016-WECO02 | ||
| Export • | reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml) | ||