Author: Wang, Z.
Paper Title Page
TUPYP048 A High Repetition Rate Free-electron Laser Shutter System 101
 
  • J.C. Gu, H. Jiang, Y. Tong, Z. Wang
    ShanghaiTech University, Shanghai, People’s Republic of China
 
  The Shanghai High repetition rate XFEL and Extreme light facility (SHINE) is the first high repetition rate XFEL in China. It is a powerful tool for scientific research. However, the high repetition rate XFEL has a high peak power and average power. The high peak power can damage optics and devices in the optical path in femtosecond. And the high average power will cause the distortion of optics. Consequently, it becomes crucial to protect optics and devices in the optical path. This shutter system is designed to protect the diagnostics and avoid thermal distortion and thermal damage. It can control the number of pulses and average power on the diagnostics. The time window of shutter can be as small as 10 ms. It has can absorb most of FEL power.  
DOI • reference for this paper ※ doi:10.18429/JACoW-MEDSI2023-TUPYP048  
About • Received ※ 24 October 2023 — Revised ※ 05 November 2023 — Accepted ※ 09 November 2023 — Issued ※ 18 January 2024
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THOBM04 Development of a Mirror Chamber System for SHINE Project 266
 
  • F. Liu, S. He, W. Li, Z. Wang, T. Wu, H. Yuan, X. Zhang
    ShanghaiTech University, Shanghai, People’s Republic of China
  • J.H. Chen, L. Zhang, W. Zhu
    SARI-CAS, Pudong, Shanghai, People’s Republic of China
 
  A 5-dof mirror chamber test system was developed to adjust offset mirror or distribution mirror for the SHINE project. Two linear guides were used for horizontal translation and rough pitch adjustment. three vertical gearboxes were used for height, roll and yaw adjustments. in the vacuum, a fine flexure structure was engineered for the fine pitch adjustment with a piezo actuator. To prevent the cooling vibrations, the cooling module was seperately fixed and the heat from the mirror was conducted by Ga/In to the cooling block. Pitch angular vibration were measured by several equipments with different conditions. Results showed that the pitch angular vibration is below 40nrad without active vibration control, and below 10nrad with active vibration isolation system.  
DOI • reference for this paper ※ doi:10.18429/JACoW-MEDSI2023-THOBM04  
About • Received ※ 02 November 2023 — Revised ※ 06 November 2023 — Accepted ※ 09 November 2023 — Issued ※ 23 February 2024
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