Author: Na, D.H.
Paper Title Page
WEPPP053
PAL-EUV Storage Ring Girder System Design, Manufacturing, and Installation  
 
  • B.J. Kim, S.B. Lee, D.H. Na
    PAL, Pohang, Republic of Korea
 
  The PAL-EUV accelerator is relatively small in size, and the SRARC, which corresponds to 1/4 of the Storage Ring, consists of a total of 35 magnets with a diameter of approximately 7.2m, which is about 1/4 of the full size. The distance between the magnets in this section (Coil Epoxy) is approximately 20mm, and there are no bellows included. Initially, the Girder System Concept considered placing girders in separate cells, but due to the absence of bellows that compensate for the flexibility of the Vacuum Chamber, it was changed to a 1 piece type that can support the entire SRARC. In order to fabricate the curved structure with precision tolerances of approximately 6m, the girder was divided into 3 pieces and assembled to achieve the 1 piece type. The actual fabrication and installation work were conducted to verify its functionality.  
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WEPPP055
Development of Photon Absorber for Multipurpose Synchrotron Radiation  
 
  • S.B. Lee, T. Ha, M.S. Hong, D.H. Na
    PAL, Pohang, Republic of Korea
 
  A photon absorber is a device used to protect vacuum chambers from intense photon beams generated from insertion devices and bending magnets. Such absorber absorbs excess photons as thermal energy and protects vacuum chambers and experimental apparatuses from potential damage. Simultaneously, these absorbers provide precisely tuned photon beams into beamlines.  
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WEPPP056
PAL-EUV Vacuum System  
 
  • D.H. Na, B.J. Kim, S.H. Kim, S.B. Lee, Y.J. Park
    PAL, Pohang, Republic of Korea
 
  The PAL-EUV accelerator consists of a linear accelerator, booster, and storage-ring, including an injector. The electron beam generated by the injector laser is accelerated to 20 MeV in the linear accelerator, then its energy is raised to 400 MeV in the booster before being injected into the storage-ring. The electron beam injected into the storage-ring emits the photons used in the beamline as it passes through the insertion device. All vacuum devices, chambers, and supports for EUV have been manufactured, and individual vacuum leak tests have been completed for both the chambers and the vacuum devices. Currently, all vacuum devices and supports have been installed. Additionally, based on vacuum simulation results, vacuum components such as ion pumps, vacuum gauges, and vacuum valves have been positioned and the required vacuum levels for each section have been satisfied. Specifically, Baking and NEG activation procedures were performed to reach the required vacuum levels for storage-ring, thus achieving the vacuum level required for the EUV accelerator  
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