Author: Kim, S.H.
Paper Title Page
WEPPP056
 PAL-EUV Vacuum System  
 
  • D.H. Na, B.J. Kim, S.H. Kim, S.B. Lee, Y.J. Park
    PAL, Pohang, Republic of Korea
  
  The PAL-EUV ac­cel­er­a­tor con­sists of a lin­ear ac­cel­er­a­tor, booster, and stor­age-ring, in­clud­ing an in­jec­tor. The elec­tron beam gen­er­ated by the in­jec­tor laser is ac­cel­er­ated to 20 MeV in the lin­ear ac­cel­er­a­tor, then its en­ergy is raised to 400 MeV in the booster be­fore being in­jected into the stor­age-ring. The elec­tron beam in­jected into the stor­age-ring emits the pho­tons used in the beam­line as it passes through the in­ser­tion de­vice. All vac­uum de­vices, cham­bers, and sup­ports for EUV have been man­u­fac­tured, and in­di­vid­ual vac­uum leak tests have been com­pleted for both the cham­bers and the vac­uum de­vices. Cur­rently, all vac­uum de­vices and sup­ports have been in­stalled. Ad­di­tion­ally, based on vac­uum sim­u­la­tion re­sults, vac­uum com­po­nents such as ion pumps, vac­uum gauges, and vac­uum valves have been po­si­tioned and the re­quired vac­uum lev­els for each sec­tion have been sat­is­fied. Specif­i­cally, Bak­ing and NEG ac­ti­va­tion pro­ce­dures were per­formed to reach the re­quired vac­uum lev­els for stor­age-ring, thus achiev­ing the vac­uum level re­quired for the EUV ac­cel­er­a­tor  
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WEPPP057
 Development of Advanced Mirror Adjustment Device for Multipurpose Synchrotron Radiation  
 
  • S.H. Kim, D. Jeong, S.H. Kim
    PAL, Pohang, Republic of Korea
  
  The Po­hang Ac­cel­er­a­tor Lab­o­ra­tory’s PLS-II beam­line cur­rently uti­lizes three types of mir­ror ad­just­ment de­vices, which have been de­vel­oped and in use for sev­eral years. Based on the ex­pe­ri­ence gained from the de­vel­op­ment and pro­duc­tion of these mir­ror ad­just­ment de­vices, a new type of mir­ror ad­just­ment de­vice is being de­vel­oped for the Multi-Pur­pose Syn­chro­tron Ra­di­a­tion Ac­cel­er­a­tor (4GSR) beam­line under con­struc­tion in Ochang, Chungcheong­buk-do. The types of mir­ror ad­just­ment de­vices are cat­e­go­rized as the KB Mir­ror Sys­tem, Ben­der Mir­ror Sys­tem, and Mir­ror Sys­tem. In the de­vel­op­ment of the mir­ror ad­just­ment de­vice, the de­sign should aim to min­i­mize the de­for­ma­tion of the mir­ror in the Mir­ror Mount­ing process. Ad­di­tion­ally, ef­forts are being made to de­sign the mir­ror cool­ing sys­tem to max­i­mize cool­ing ef­fi­ciency, and var­i­ous tests are being con­ducted to im­prove the me­chan­i­cal sta­bil­ity and ad­dress vi­bra­tion is­sues in the Mir­ror Ma­nip­u­la­tor struc­ture. The de­vel­op­ment of the mir­ror ad­just­ment de­vice aims to up­grade its per­for­mance and suc­cess­fully in­stall it in the Multi-Pur­pose Syn­chro­tron Ra­di­a­tion Ac­cel­er­a­tor beam­line.  
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