Author: de Oliveira, R.G.
Paper Title Page
TUPYP008 Exactly Constrained, High Heat Load Design for SABIA’s First Mirror 44
 
  • V.B. Zilli, G.G. Basilio, J.C. Cezar, F.A. Del Nero, G.R.B. Ferreira, B.A. Francisco, M.E.O.A. Gardingo, R.R. Geraldes, A.C. Pinto, G.L.M.P. Rodrigues, L.M. Volpe, V.S. Ynamassu, R.G. de Oliveira
    LNLS, Campinas, Brazil
  • C. Ambrosio
    CNPEM, Campinas, SP, Brazil
 
  Funding: Ministry of Science, Technology and Innovation (MCTI)
The SABIA beam­line (Soft x-ray AB­sorp­tion spec­troscopy and ImAg­ing) will op­er­ate in a range of 100 to 2000 eV and will per­form XPS, PEEM and XMCD tech­niques at SIR­IUS/LNLS. Ther­mal man­age­ment on these soft x-ray beam­lines is par­tic­u­larly chal­leng­ing due to the high heat loads. SABIA’s first mir­ror (M1) ab­sorbs about 360 W, with a max­i­mum power den­sity of 0.52 W/mm², and a wa­ter-cooled mir­ror was de­signed to han­dle this sub­stan­tial heat load. To pro­long the mir­ror op­er­a­tion life­time, often short­ened on soft X-ray beam­lines due to car­bon de­po­si­tion on the mir­ror op­ti­cal sur­face, a pro­ce­dure was adopted using high par­tial pres­sure of O₂ into the vac­uum cham­ber dur­ing the com­mis­sion­ing phase. The in­ter­nal mech­a­nism was de­signed to be ex­actly con­strained using folded leaf springs. It pre­sents one de­gree of free­dom for con­trol and align­ment: a ro­ta­tion around the ver­ti­cal axis with a mo­tion range of about ±0.6 mrad, pro­vided by a piezo­elec­tric ac­tu­a­tor and mea­sured using vac­uum com­pat­i­ble lin­ear en­coders. This work de­scribes the SABIA’s M1 ex­actly con­strained, high heat ab­sorbent de­sign, its safety par­tic­u­lar­i­ties com­pared to SIR­IUS typ­i­cal mir­rors, and val­i­da­tion tests re­sults.
 
poster icon Poster TUPYP008 [1.582 MB]  
DOI • reference for this paper ※ doi:10.18429/JACoW-MEDSI2023-TUPYP008  
About • Received ※ 02 November 2023 — Revised ※ 03 November 2023 — Accepted ※ 09 November 2023 — Issued ※ 21 February 2024
Cite • reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)