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MOXC02 | Improved Lifetime of a High Spin Polarization Superlattice Photocathode | 31 |
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Funding: Department of Energy under grant DE-SC0012704 Highly spin polarized electron beams are required for the operation of a wide range of accelerators and instruments. The production of such electrons requires the use of Negative Electron Affinity (NEA) activated GaAs-based cathodes operated in photoelectron guns. Because of their extreme sensitivity to poor vacuum conditions the degradation of the photoemission process is so strong that NEA activated GaAs-based photocathodes can only survive in the extreme vacuums typical of DC gun. State-of-the-art on photocathode technology for spin polarized beam productions are summarized. Recent results on the use of robust NEA coating based on the Cs-Te and Cs-Sb leading to improved operational lifetime of a high spin polarization photocathode are reviewed. |
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DOI • | reference for this paper ※ https://doi.org/10.18429/JACoW-IPAC2021-MOXC02 | |
About • | paper received ※ 20 May 2021 paper accepted ※ 19 July 2021 issue date ※ 19 August 2021 | |
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WEPAB157 | Understanding the Growth Dynamics Cs-Sb Thin Films via In-Situ Characterization Techniques: Towards Epitaxial Alkali Antimonide Photocathodes | 2979 |
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Funding: National Science Foundation award PHY-1549132, the Center for Bright Beams and PARADIM, Cooperative Agreement No.DMR-1539918. Alkali antimonide photocathodes, such as Cs3Sb, have attractive properties, such as low emittance and high quantum efficiency, which makes them excellent candidates for next-generation high-brightness electron sources. A large number of studies in literature focus on quantum efficiency and lifetime, and fewer report chemical and structural analysis, despite the latter ultimately determine the brightness at the photocathode. Epitaxial, single-crystalline films would allow to study the intrinsic properties of alkali antimonide photocathodes and to optimize them for maximum brightness, but this goal remains elusive. A strong limiting factor is the extreme air sensitivity, preventing ex-situ structural and chemical analysis. We report a study on the growth of Cs-Sb films via molecular beam epitaxy with reflection high-energy electron diffraction to monitor the growth in real time. The samples were characterized via in-situ ultraviolet photoelectron spectroscopy, x-ray photoelectron spectroscopy and scanning tunneling microscopy. Cs3Sb and CsSb phases can be stabilized on appropriate single crystal substrates, with the latter reproducibly resulting in atomically smooth surfaces. |
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DOI • | reference for this paper ※ https://doi.org/10.18429/JACoW-IPAC2021-WEPAB157 | |
About • | paper received ※ 19 May 2021 paper accepted ※ 30 June 2021 issue date ※ 10 August 2021 | |
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