| Paper | Title | Page |
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| WEPRB070 | Facile Deposition of Superconducting MgB2 Thin Films on Substrates: A Comparative Investigation of Electrochemical Deposition and Magnetron Sputtering Techniques | 2984 |
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Funding: Authors acknowledge the funding received under the Rutherford International Postdoctoral Fellowship Programme Coating of Copper cavities with a superconducting layer of MgB2 thin film is an attractive alternative to bulk Nb cavities. In this work, we investigate the application of two approaches-electrochemical deposition and magnetron sputtering of MgB2, to fabricate MgB2 films with potential accelerator applications. In the first approach, MgB2 powder dispersed in acetone was used as an electrolytic medium. Application of a DC voltage of 400 V between a graphite anode and a Copper film (serving as cathode), with the electrode distance maintained at ~2cm, resulted in the electrochemical deposition of MgB2 on the Cu surface. In an alternate approach, MgB2 in powder form was used directly for sputtering based deposition. The powder was initially compacted to form a thin layer that served as the magnetron target. Application of a pulsed DC power of 25W for 4 hours yielded MgB2 thin film on Si substrates. Samples were characterized by XPS analysis to ascertain their elemental composition, which confirmed the presence of Mg and B, in addition to traces of C and O as impurities. Surface morphology was determined using SEM characterization technique. Further work to determine the superconducting properties of the samples and fine tune the deposition processes for large scale MgB2 deposition inside actual RF cavities is in progress. |
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| DOI • | reference for this paper ※ https://doi.org/10.18429/JACoW-IPAC2019-WEPRB070 | |
| About • | paper received ※ 15 May 2019 paper accepted ※ 20 May 2019 issue date ※ 21 June 2019 | |
| Export • | reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml) | |