Author: Hayano, H.
Paper Title Page
MOPVA075 Development of High Sensitive X-Ray Mapping for SC Cavities 1040
 
  • H. Tongu, H. Hokonohara, Y. Iwashita
    Kyoto ICR, Uji, Kyoto, Japan
  • R.L. Geng, A.D. Palczewski
    JLab, Newport News, Virginia, USA
  • H. Hayano, T. Kubo, T. Saeki, Y. Yamamoto
    KEK, Ibaraki, Japan
  • H. Oikawa
    Utsunomiya University, Utsunomiya, Japan
  
  We developed an X-ray mapping system sX-map for superconducting cavities. The sensors are inserted under the stiffener rings between cavity cells, whose locations are close to the iris areas. The whole circuits are im-mersed in liquid He and the multiplexed signals reduces the number of cables to the room temperature region. sX-map has the advantages in its compact size, low cost and simple setup for nondestructive inspections. The sX-map system detected X-rays from field emissions in vertical RF tests of ILC 9-cell cavities at Jefferson Lab (JLab) and KEK. sX-map showed an excellent performance in the meas-urement test at JLab, it exhibited a high sensitivity com-pared with an the fixed diode rings colocated at irises and ion chamber located out side of the vertical test cryostat.  
DOI • reference for this paper ※ https://doi.org/10.18429/JACoW-IPAC2017-MOPVA075  
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MOPVA076 Measurement of Thin Film Coating on Superconductors 1043
 
  • Y. Iwashita, Y. Fuwa, H. Tongu
    Kyoto ICR, Uji, Kyoto, Japan
  • H. Hayano, T. Kubo, T. Saeki
    KEK, Ibaraki, Japan
  • M. Hino
    Kyoto University, Research Reactor Institute, Osaka, Japan
  • H. Oikawa
    Utsunomiya University, Utsunomiya, Japan
  
  Funding: This research is supported by following programs: Grant-in-Aid for Exploratory Research JSPS KAKENHI Grant Number 26600142 and Photon and Quantum Basic Research Coordinated Development Program from the MEXT.
Multilayer thin film coating is a promising technology to enhance performance of superconducting cavities. Until recently, principal parameters to achieve the sufficient performance had not been known, such as the thickness of each layer. We proposed a method to deduce a set of the parameters to exhibit a good performances. In order to verify the scheme, we are trying to make some experiments on the subject at Kyoto. The sample preparation and the test setup for the measurement apparatus will be discussed. 		 
DOI • reference for this paper ※ https://doi.org/10.18429/JACoW-IPAC2017-MOPVA076  
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MOPVA115 Status and Challenges of Vertical Electro-Polishing R&D at Cornell 1115
 
  • F. Furuta, M. Ge, T. Gruber, D.L. Hall, J.J. Kaufman, M. Liepe, R.D. Porter, J. Sears
    Cornell University (CLASSE), Cornell Laboratory for Accelerator-Based Sciences and Education, Ithaca, New York, USA
  • V. Chouhan, Y.I. Ida, K.N. Nii, T.Y. Yamaguchi
    MGH, Hyogo-ken, Japan
  • T.D. Hall, M.E. Inman, R. Radhakrishnan, S.T. Snyder, E.J. Taylor
    Faraday Technology, Inc., Clayton, Ohio, USA
  • H. Hayano, S. Kato, T. Saeki
    KEK, Ibaraki, Japan
  
  Advanced Vertical Electro-Polishing (VEP) R&D for SRF Niobium cavities continues at Cornell's SRF group. One focus of this work is new EP cathode development in collaboration with KEK and Marui Galvanizing Co. Ltd (Marui) in Japan, and another focus is on HF free or acid free VEP protocols in collaboration with Faraday Technology Inc. The outcomes of these activities could be a significant cost reduction and an environmentally-friendlier VEP, which would be a breakthrough for future large scale EP applications on SRF cavities. Here we give a status update and report latest results from these R&D activities.  
DOI • reference for this paper ※ https://doi.org/10.18429/JACoW-IPAC2017-MOPVA115  
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