Author: Fung, H.K.
Paper Title Page
TUPAB128 Single Photoemitter Tips in a DC Gun: Limiting Aberration-induced Emittance 1622
 
  • I.V. Bazarov, L. Cultrera, C.M. Gulliford, H. Lee
    Cornell University (CLASSE), Cornell Laboratory for Accelerator-Based Sciences and Education, Ithaca, New York, USA
  • H.K. Fung
    Cornell University, Ithaca, New York, USA
  • J.M. Maxson
    UCLA, Los Angeles, California, USA
 
  Ultrafast electron diffraction (UED) offers unique advantages over x-ray diffraction, like stronger scattering cross-section, versatility in sample types and ability to offer smaller apparatus foot print. There is a growing need to increase brightness of electron beams especially for single-shot UED applications. We explore the utilization of field enhancement from a micron-scale single tip inside a DC gun to obtain brighter sub-pC electron beams using a nominal cathode electric field of several MV/m. The additional field enhancement can place moderate voltage sources on par with the highest gradient devices and allow improved performance presently not possible in the existing photoemission guns.  
DOI • reference for this paper ※ https://doi.org/10.18429/JACoW-IPAC2017-TUPAB128  
Export • reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)