JACoW logo

Joint Accelerator Conferences Website

The Joint Accelerator Conferences Website (JACoW) is an international collaboration that publishes the proceedings of accelerator conferences held around the world.

https://doi.org/10.18429/JACoW-ECRIS2016-WEPP40
Title Fast Sputtering Measurement Studies using Uranium with the NSCL ECR Ion Sources
Authors
  • D.E. Neben, J. Fogleman, A.N. Pham, S. Renteria, L. Tobos
    NSCL, East Lansing, Michigan, USA
  • D. Leitner
    LBNL, Berkeley, California, USA
  • G. Machicoane
    FRIB, East Lansing, Michigan, USA
  • G. Parsey
    MSU, East Lansing, Michigan, USA
  • J.P. Verboncoeur
    Michigan State University, East Lansing, Michigan, USA
Abstract Existing heavy ion facilities such as the National Superconducting Cyclotron Laboratory (NSCL) at Michigan State University rely on Electron Cyclotron Resonance (ECR) ion sources as injectors of highly charged ion beams. Long ion confinement times are necessary to produce dense populations of highly charged ions because of steadily decreasing ionization cross sections with increasing charge state. To further understand ion extraction and confinement we are using a fast sputtering technique first developed at Argonne National Laboratory [1] to introduce a small amount of uranium metal into the plasma at a well-defined time. In addition we utilize an axial x-ray apparatus [2] to characterize the hot electron plasma population via its bremsstrahlung emission.
Footnotes & References *R. Vondrasek, et. Al., Rev. Sci. Instrum. 73, 548 (2002)
**T. Ropponen, et. Al., Proceedings of ECRIS2010, Grenoble France (2010)
Funding Michigan State University and the National Science Foundation: NSF Award Number PHY-1415462
Paper download WEPP40.PDF [1.050 MB / 5 pages]
Export download ※ BibTeX ※ LaTeX ※ Text/Word ※ RIS ※ EndNote
Conference ECRIS2016, Busan, Korea
Series International Workshop on ECR Ion Sources (22nd)
Proceedings Link to full ECRIS2016 Proccedings
Session Poster session
Date 31-Aug-16   15:20–17:20
Main Classification Plasma physics and techniques
Keywords ion, plasma, ECR, high-voltage, injection
Publisher JACoW, Geneva, Switzerland
Editors Volker RW Schaa (GSI, Darmstadt, Germany)
ISBN 978-3-95450-186-1
Published October 2016
Copyright
Copyright © 2016 by JACoW, Geneva, Switzerland     CC-BY Creative Commons License
cc Creative Commons Attribution 3.0