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RIS citation export for WEPP40: Fast Sputtering Measurement Studies using Uranium with the NSCL ECR Ion Sources

TY - CONF
AU - Neben, D.E.
AU - Fogleman, J.
AU - Leitner, D.
AU - Machicoane, G.
AU - Parsey, G.
AU - Pham, A.N.
AU - Renteria, S.
AU - Tobos, L.
AU - Verboncoeur, J.P.
ED - Schaa, Volker RW
TI - Fast Sputtering Measurement Studies using Uranium with the NSCL ECR Ion Sources
J2 - Proc. of ECRIS2016, Busan, Korea, August 28 - September 1, 2016
C1 - Busan, Korea
T2 - International Workshop on ECR Ion Sources
T3 - 22
LA - english
AB - Existing heavy ion facilities such as the National Superconducting Cyclotron Laboratory (NSCL) at Michigan State University rely on Electron Cyclotron Resonance (ECR) ion sources as injectors of highly charged ion beams. Long ion confinement times are necessary to produce dense populations of highly charged ions because of steadily decreasing ionization cross sections with increasing charge state. To further understand ion extraction and confinement we are using a fast sputtering technique first developed at Argonne National Laboratory [1] to introduce a small amount of uranium metal into the plasma at a well-defined time. In addition we utilize an axial x-ray apparatus [2] to characterize the hot electron plasma population via its bremsstrahlung emission.
PB - JACoW
CP - Geneva, Switzerland
SP - 129
EP - 133
KW - ion
KW - plasma
KW - ECR
KW - high-voltage
KW - injection
DA - 2016/10
PY - 2016
SN - 978-3-95450-186-1
DO - 10.18429/JACoW-ECRIS2016-WEPP40
UR - http://jacow.org/ecris2016/papers/wepp40.pdf
ER -