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Gowa, T.

Paper Title Page
MOPC043 Design of LINAC Based Compact X-ray Source via Inverse Compton Scattering at Waseda University 166
 
  • A. Masuda, T. Gowa, C. Igarashi, T. Kashino, N. Mitsuda, K. Sakaue, M. Washio
    RISE, Tokyo
  • H. Hayano, J. Urakawa
    KEK, Ibaraki
  • S. Kashiwagi
    ISIR, Osaka
  • R. Kuroda
    AIST, Tsukuba, Ibaraki
  • K. U. Ushida
    RIKEN, Saitama
 
  A table-top size soft X-ray source based on inverse Compton scattering has been developed at Waseda University. We have already succeeded in generating X-rays via inverse Compton scattering between 4.6 MeV electron beam generated from a photocathode RF-gun and 1047nm Nd:YLF laser. The energy of the X-ray is within the 'water window' region which can be applied for the soft X-ray microscope for biological observation. In 2007, new RF-gun cavity with Cs-Te photocathode in place of copper has been installed. The energy of electron beam became up to 5.5MeV due to the increase of Q-value of the gun cavity. According to this achievement, generated X-ray energies will cover overall the 'water window' region. We are planning a multi-pulse inverse Compton scattering X-ray generation system in order to enhance a luminous intensity of the X-rays. For this purpose, we are considering a multi-pulse UV laser system for generating a multi-bunch electron beam, the method for beam loading compensation, and the multi-pulse IR laser system for the Compton collisions. Experimental results of X-ray generation and multi-pulse X-ray plans will be presented at the conference.  
TUPP155 Compact EUV Source Based on Laser Compton Scattering between Micro-bunched Electron Beam and CO2 Laser Pulse 1869
 
  • S. Kashiwagi, G. Isoyama, R. Kato
    ISIR, Osaka
  • T. Gowa, A. Masuda, T. Nomoto, K. Sakaue, M. Washio
    RISE, Tokyo
  • R. Kuroda
    AIST, Tsukuba, Ibaraki
  • J. Urakawa
    KEK, Ibaraki
 
  High-power extreme ultra-violet (EUV) sources are required for next generation semiconductor lithography. We start developing a compact EUV source in the spectral range of 13-14 nm, which is based on laser Compton scattering between a micro-bucnhed electron beam and a high intensity CO2 laser pulse. The electron beam extracted from a DC photocathode gun is micro-bunched using laser modulation techinque and a magnetic compressor before the main laser Compton scattering for EUV radiation. We will describe a considerating scheme for the compact EUV source based on laser Compton scattering with micro-bunched electron beam and the result of its numerical studies. A plan of test experiment generating micro-bunched electron beam will be also introduced in this conference.  
TUPP158 Development of Laser System for Compact Laser Compton Scattering X-ray Source 1878
 
  • R. Kuroda, M. K. Koike, H. Toyokawa, K. Y. Yamada
    AIST, Tsukuba, Ibaraki
  • T. Gowa, A. Masuda, K. Sakaue, M. Washio
    RISE, Tokyo
  • S. Kashiwagi
    ISIR, Osaka
  • T. Nakajyo, F. Sakai
    SHI, Tokyo
 
  A compact X-ray source via laser Compton scattering is required for biological, medical and industrial science because it has many benefits about generated X-rays such as short pulse, quasi-monochromatic, energy tunability and good directivity. Our X-ray source is conventionally the single collision system between an electron pulse and a laser pulse. To increase X-ray yield, we have developed a multi-collision system with a multi-bunch electron beam and a laser optical cavity. The multi-bunch beam will be generated from a Cs-Te photocathode rf gun sytem using a multi-pulse UV laser system. The laser optical cavity will be built like the regenerative amplification including the collision point between the electron pulse and the laser pulse to enhance the laser peak power per 1 collision on laser Compton scattering. In this conference, we will describe the results of preliminary experiments for the multi-collision system and future plans.