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Roehrs, M.

Paper Title Page
MOPCH013 Slice Emittance Measurements at FLASH 77
 
  • M. Roehrs, C. Gerth, M. Huening, H. Schlarb
    DESY, Hamburg
 
  The SASE process in Free Electron Lasers mainly depends on time-sliced parameters of charge density, energy spread and transverse emittance. At the VUV-FEL at DESY, electron bunches are compressed longitudinally in two magnetic chicanes in order to achieve high peak currents. The compression causes considerabe variations in slice emittance along the bunches. The vertically deflecting rf-structure LOLA, which is in operation at the VUV-FEL since early 2005, allows to resolve longitudinal variations in horizontal slice width for single bunches. The horizontal slice emittances can be determined by additionally varying the strengths of the quadrupoles upstream of LOLA. Results of slice emittance measurements using different bunch compression schemes are presented.  
MOPCH014 Energy-time Correlation Measurements Using a Vertically Deflecting RF Structure 80
 
  • M. Roehrs, C. Gerth, M. Huening, H. Schlarb
    DESY, Hamburg
 
  To initiate the lasing process in SASE-based Free Electron Lasers, electron bunches with high peak currents are necessary. At the VUV-FEL at DESY, high peak currents are produced by bunch shortening in magnetic chicanes induced by a linear energy-time gradient. The residual uncorrelated time-sliced energy width after compression is a crucial parameter for the lasing process. The final energy-time correlation provides important information about the compression process. This paper presents a measurement of slice energy spread and energy-time correlation using a vertically deflecting rf-structure (LOLA). The structure allows to map the time delay of bunch slices to the vertical axis of a screen. After dispersing the bunches horizontally with a dipole, the energy-time correlation can be directly obtained in a single shot measurement. Results for different bunch compression schemes are presented. The measured bunch length in case of a non-compressed beam is compared to streak camera measurements.  
TUPCH024 Comparative Study of Bunch Length and Arrival Time Measurements at FLASH 1049
 
  • H. Schlarb, A. Azima, S. Düsterer, M. Huening, E.-A. Knabbe, M. Roehrs, R. Rybnikov, B. Schmidt, B. Steffen
    DESY, Hamburg
  • M.C. Ross
    SLAC, Menlo Park, California
  • P. Schmüser, A. Winter
    Uni HH, Hamburg
 
  Diagnostic devices to precisely measure the longitudinal electron beam profile and the bunch arrival time require elaborate new instrumentation techniques. At the VUV-FEL, two entirely different methods are used. The bunch profile can be determined with high precision by a transverse deflecting RF structure. The method is disruptive and does not allow to monitor multiple bunches in a macro-pulse train. Therefore, it is augmented by two non-disruptive electro-optical devices, called EO and TEO. The EO setup uses a dedicated diagnostic laser synchronized to the machine RF. The longitudinal electron beam profile is encoded in the intensity profile of a chirped laser pulse and analyzed by looking at the spectral composition of the pulse. The second setup, TEO, utilizes the TiSa-based laser system used for pump-probe experiments. Here, the temporal electron shape is encoded into a spatial dimension of laser pulse by an intersection angle between the laser and the electron beam at the EO-crystal. In this paper, we present a comparative study of bunch length and arrival time measurements performed simultaneously with all three experimental techniques.