Author: Wilde, S.
Paper Title Page
TUPB040 High Power Impulse Magnetron Sputtering of Thin Films for Superconducting RF Cavities 647
 
  • S. Wilde, B. Chesca
    Loughborough University, Loughborough, Leicestershire, United Kingdom
  • E. Alves
    Associação EURATOM/IST, Instituto de Plasmas e Fusão Nuclear, Lisboa, Portugal
  • N.P. Barradas
    Universidade de Lisboa, Instituto Superior Técnico, Bobadela, Portugal
  • A.N. Hannah, O.B. Malyshev, S.M. Pattalwar, R. Valizadeh
    STFC/DL/ASTeC, Daresbury, Warrington, Cheshire, United Kingdom
  • G.B.G. Stenning
    STFC/RAL/ISIS, Chilton, Didcot, Oxon, United Kingdom
  
  The production of superconducting coatings for radio frequency cavities is a rapidly developing field that should ultimately lead to acceleration gradients greater than those obtained by bulk Nb RF cavities. Optimizing superconducting properties of Nb and Nb compound thin-films is therefore essential. Nb films were deposited by magnetron sputtering in pulsed DC mode onto Si (100) and MgO (100) substrates and also by high impulse magnetron sputtering (HiPIMS) onto Si (100), MgO (100) and polycrystalline Cu. HiPIMS was then used to deposit NbN and NbTiN thin films onto Si(100) and polycrystalline Cu. The films were characterised using scanning electron microscopy, x-ray diffraction, DC SQUID magnetometry and Q factor for a flat thin film sample.  
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