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Fadina, T.
Paper
Title
Page
THP31
Characteristics of TiN Anti-multipactor Layers Reached By Titanium Vapor Deposition on Alumina Coupler Windows
697
J. Lorkiewicz
,
T. Fadina
DESY, Hamburg
J. Kula, S. Pszona
The Andrzej Soltan Institute for Nuclear Studies, Swierk
A. Bilinski, J. Sobczak
Institute of Physical Chemistry, Warsaw
Z. Yu
IHEP Beijing, Beijing