IPAC2015 - List of Authors (Walsh, J.)

Paper	Title	Page
TUPHA003	Sputter Growth of Alkali Antimonide Photocathodes: An in Operando Materials Analysis	1965
	J. Smedley, K. Attenkofer, M. Gaowei, J. Sinsheimer, J. Walsh BNL, Upton, Long Island, New York, USA H. Bhandari Radiation Monitoring Devices, Watertown, USA Z. Ding, E.M. Muller SBU, Stony Brook, New York, USA H.J. Frisch Enrico Fermi Institute, University of Chicago, Chicago, Illinois, USA H.A. Padmore, S.G. Schubert, J.J. Wong LBNL, Berkeley, California, USA
	Funding: Work supported by U.S. DoE, under KC0407-ALSJNT-I0013 and SBIR grant # DE-SC0009540. NSLS was supported by DOE DE-AC02-98CH10886, CHESS is supported by NSF & NIH/NIGMS via NSF DMR-1332208 Alkali antimonide photocathodes are a strong contender for the cathode of choice for next-generation photon sources such as LCLS II or the XFEL. These materials have already found extensive use in photodetectors and image intensifiers. However, only recently have modern synchrotron techniques enabled a systematic study of the formation chemistry of these materials. Such analysis has led to the understanding that these materials are inherently rough when grown through traditional sequential deposition; this roughness has a detrimental impact on the intrinsic emittance of the emitted beam. Sputter deposition may provide a path to achieving a far smoother photocathode, while maintaining adequate quantum efficiency. We report on the creation and vacuum transport of a K2CsSb sputter target, and its use to create an ultra-smooth (sub nm roughness) cathode with a 2% quantum efficiency at 532 nm.
DOI •	reference for this paper ※ https://doi.org/10.18429/JACoW-IPAC2015-TUPHA003
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Paper

Title

Page

Sputter Growth of Alkali Antimonide Photocathodes: An in Operando Materials Analysis

1965

J. Smedley, K. Attenkofer, M. Gaowei, J. Sinsheimer, J. Walsh
BNL, Upton, Long Island, New York, USA
H. Bhandari
Radiation Monitoring Devices, Watertown, USA
Z. Ding, E.M. Muller
SBU, Stony Brook, New York, USA
H.J. Frisch
Enrico Fermi Institute, University of Chicago, Chicago, Illinois, USA
H.A. Padmore, S.G. Schubert, J.J. Wong
LBNL, Berkeley, California, USA

Funding: Work supported by U.S. DoE, under KC0407-ALSJNT-I0013 and SBIR grant # DE-SC0009540. NSLS was supported by DOE DE-AC02-98CH10886, CHESS is supported by NSF & NIH/NIGMS via NSF DMR-1332208
Alkali antimonide photocathodes are a strong contender for the cathode of choice for next-generation photon sources such as LCLS II or the XFEL. These materials have already found extensive use in photodetectors and image intensifiers. However, only recently have modern synchrotron techniques enabled a systematic study of the formation chemistry of these materials. Such analysis has led to the understanding that these materials are inherently rough when grown through traditional sequential deposition; this roughness has a detrimental impact on the intrinsic emittance of the emitted beam. Sputter deposition may provide a path to achieving a far smoother photocathode, while maintaining adequate quantum efficiency. We report on the creation and vacuum transport of a K2CsSb sputter target, and its use to create an ultra-smooth (sub nm roughness) cathode with a 2% quantum efficiency at 532 nm.

DOI •

reference for this paper ※ https://doi.org/10.18429/JACoW-IPAC2015-TUPHA003

Export •

reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)