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RIS citation export for TUPHA003: Sputter Growth of Alkali Antimonide Photocathodes: An in Operando Materials Analysis

TY - CONF
AU - Smedley, J.
AU - Attenkofer, K.
AU - Bhandari, H.
AU - Ding, Z.
AU - Frisch, H.J.
AU - Gaowei, M.
AU - Muller, E.M.
AU - Padmore, H.A.
AU - Schubert, S.G.
AU - Sinsheimer, J.
AU - Walsh, J.
AU - Wong, J.J.
ED - Henderson, Stuart
ED - Akers, Evelyn
ED - Satogata, Todd
ED - Schaa, Volker R.W.
TI - Sputter Growth of Alkali Antimonide Photocathodes: An in Operando Materials Analysis
J2 - Proc. of IPAC2015, Richmond, VA, USA, May 3-8, 2015
C1 - Richmond, VA, USA
T2 - International Particle Accelerator Conference
T3 - 6
LA - english
AB - Alkali antimonide photocathodes are a strong contender for the cathode of choice for next-generation photon sources such as LCLS II or the XFEL. These materials have already found extensive use in photodetectors and image intensifiers. However, only recently have modern synchrotron techniques enabled a systematic study of the formation chemistry of these materials. Such analysis has led to the understanding that these materials are inherently rough when grown through traditional sequential deposition; this roughness has a detrimental impact on the intrinsic emittance of the emitted beam. Sputter deposition may provide a path to achieving a far smoother photocathode, while maintaining adequate quantum efficiency. We report on the creation and vacuum transport of a K2CsSb sputter target, and its use to create an ultra-smooth (sub nm roughness) cathode with a 2% quantum efficiency at 532 nm.
PB - JACoW
CP - Geneva, Switzerland
SP - 1965
EP - 1967
KW - cathode
KW - target
KW - emittance
KW - gun
KW - radiation
DA - 2015/06
PY - 2015
SN - 978-3-95450-168-7
DO - 10.18429/JACoW-IPAC2015-TUPHA003
UR - http://jacow.org/ipac2015/papers/tupha003.pdf
ER -