Paper | Title | Page |
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MOPWI005 | Emittance and Optics Measurements on the Versatile Electron Linear Accelerator at Daresbury Laboratory | 1153 |
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The Versatile Electron Linear Accelerator (VELA) is a facility designed to provide a high quality electron beam for accelerator systems development, as well as industrial and scientific applications. Currently, the RF gun can deliver short (of order a few ps) bunches with charge in excess of 250 pC at up to 5.0 MeV/c beam momentum. Measurement of the beam emittance and optics in the section immediately following the gun is a key step in tuning both the gun and the downstream beamlines for optimum beam quality. We report the results of measurements (taking account of coupling and space charge) indicating normalised emittances of order 0.5 μm at low bunch charge. | ||
DOI • | reference for this paper ※ https://doi.org/10.18429/JACoW-IPAC2015-MOPWI005 | |
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TUPJE056 | VELA Machine Development and Beam Characterisation | 1752 |
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Recent developments on the VELA (Versatile Electron Linear Accelerator) RF photo-injector at Daresbury Laboratory are presented. These are three-fold; commissioning/installation, characterising and providing beam to users. Measurements for characterising the dark current (DC), 4-D transverse emittance, lattice functions and photoinjector stability are presented. User beam set ups to provide beam for electron diffraction and Cavity Beam Position Monitor development are summarised. | ||
DOI • | reference for this paper ※ https://doi.org/10.18429/JACoW-IPAC2015-TUPJE056 | |
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TUPWI017 | Single-shot Multi-MeV Ultrafast Electron Diffraction on VELA at Daresbury Laboratory | 2278 |
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Funding: This work was funded by STFC Accelerator based Ultrafast Electron Diffraction (UED) is a technique for obtaining static structures and for studying sub-100 fs dynamic structural changes on the atomic scale. In this paper we present the first electron diffraction results obtained from the VELA accelerator in 2014. The accelerator was operated to provide typically 4MeV/c electron bunches. Diffraction patterns were observed with <<1 pC transported to the detection screen. Single shot and multi-shot accumulated diffraction data are presented from single crystal and polycrystalline samples, including Au, Al, Pt and C. Contamination of the diffraction pattern with dark current contributions is an issue. A variable size aperture directly in front of the sample offers some mitigation, but at the expense of reduced charge contributing to the diffraction pattern. We discuss future developments for electron diffraction on VELA including further beam optimization, measurement of bunch length with a newly installed Transverse Deflecting Cavity, and the planned developments for pump-probe studies. |
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DOI • | reference for this paper ※ https://doi.org/10.18429/JACoW-IPAC2015-TUPWI017 | |
Export • | reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml) | |