IPAC2015 - List of Authors (Peshl, J.J.)

Paper	Title	Page
WEPWI040	Experiment and Results on Plasma Etching of SRF Cavities	3581
	J. Upadhyay, J.J. Peshl, S. Popović, L. Vušković ODU, Norfolk, Virginia, USA D.S. Im Old Dominion University, Norfolk, Virginia, USA H.L. Phillips, A-M. Valente-Feliciano JLab, Newport News, Virginia, USA
	The inner surfaces of SRF cavities are currently chemically treated (etched or electro polished) to achieve the state of the art RF performance. We designed an apparatus and developed a method for plasma etching of the inner surface for SRF cavities. The process parameters (pressure, power, gas concentration, diameter and shape of the inner electrode, temperature and positive dc bias at inner electrode) are optimized for cylindrical geometry. The etch rate non-uniformity has been overcome by simultaneous translation of the gas point-of-entry and the inner electrode during the processing. A single cell SRF cavity has been centrifugally barrel polished, chemically etched and RF tested to establish a baseline performance. This cavity is plasma etched and RF tested afterwards. The effect of plasma etching on the RF performance of this cavity will be presented and discussed.
DOI •	reference for this paper ※ https://doi.org/10.18429/JACoW-IPAC2015-WEPWI040
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Paper

Title

Page

Experiment and Results on Plasma Etching of SRF Cavities

3581

J. Upadhyay, J.J. Peshl, S. Popović, L. Vušković
ODU, Norfolk, Virginia, USA
D.S. Im
Old Dominion University, Norfolk, Virginia, USA
H.L. Phillips, A-M. Valente-Feliciano
JLab, Newport News, Virginia, USA

The inner surfaces of SRF cavities are currently chemically treated (etched or electro polished) to achieve the state of the art RF performance. We designed an apparatus and developed a method for plasma etching of the inner surface for SRF cavities. The process parameters (pressure, power, gas concentration, diameter and shape of the inner electrode, temperature and positive dc bias at inner electrode) are optimized for cylindrical geometry. The etch rate non-uniformity has been overcome by simultaneous translation of the gas point-of-entry and the inner electrode during the processing. A single cell SRF cavity has been centrifugally barrel polished, chemically etched and RF tested to establish a baseline performance. This cavity is plasma etched and RF tested afterwards. The effect of plasma etching on the RF performance of this cavity will be presented and discussed.

DOI •

reference for this paper ※ https://doi.org/10.18429/JACoW-IPAC2015-WEPWI040

Export •

reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)