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TY - CONF AU - Upadhyay, J. AU - Im, D.S. AU - Peshl, J.J. AU - Phillips, H.L. AU - Popović, S. AU - Valente-Feliciano, A-M. AU - Vušković, L. ED - Henderson, Stuart ED - Akers, Evelyn ED - Satogata, Todd ED - Schaa, Volker R.W. TI - Experiment and Results on Plasma Etching of SRF Cavities J2 - Proc. of IPAC2015, Richmond, VA, USA, May 3-8, 2015 C1 - Richmond, VA, USA T2 - International Particle Accelerator Conference T3 - 6 LA - english AB - The inner surfaces of SRF cavities are currently chemically treated (etched or electro polished) to achieve the state of the art RF performance. We designed an apparatus and developed a method for plasma etching of the inner surface for SRF cavities. The process parameters (pressure, power, gas concentration, diameter and shape of the inner electrode, temperature and positive dc bias at inner electrode) are optimized for cylindrical geometry. The etch rate non-uniformity has been overcome by simultaneous translation of the gas point-of-entry and the inner electrode during the processing. A single cell SRF cavity has been centrifugally barrel polished, chemically etched and RF tested to establish a baseline performance. This cavity is plasma etched and RF tested afterwards. The effect of plasma etching on the RF performance of this cavity will be presented and discussed. PB - JACoW CP - Geneva, Switzerland SP - 3581 EP - 3583 KW - cavity KW - plasma KW - SRF KW - niobium KW - ion DA - 2015/06 PY - 2015 SN - 978-3-95450-168-7 DO - 10.18429/JACoW-IPAC2015-WEPWI040 UR - http://jacow.org/ipac2015/papers/wepwi040.pdf ER -