Author: Shibuya, T.
Paper Title Page
MOPRI009 Study on New Method for Generating Highly Charged Ions with Double Pulse Laser Ion Source 595
SUSPSNE029   use link to see paper's listing under its alternate paper code  
 
  • T. Shibuya
    TIT, Tokyo, Japan
  • N. Hayashizaki
    RLNR, Tokyo, Japan
  • M. Yoshida
    KEK, Ibaraki, Japan
 
  Laser ion source capable of generating high intensity ions is best for the ion source of RI beam facilities. A great deal of effort has been made on particle number as DPIS. Only few attempts have so far been made at generating highly charged ions. One of previous research has reported that Au+53 ions are produced by PALS laser. "Nonlinear process" mechanisms such as resonance absorption and self-focusing were used for this. However, these methods have limitation due to low repetition rate of the laser. Nd (λ=1064nm, E<1.2J, t~10ns) and Yb laser(λ=1030nm, E<10J, t~500fs) systems is possible to operate at 10 - 50Hz repetition rate. This double pulse laser system, with attainable laser intensity up to about 1017[W/cm2], was used to generate highly charged ions of solid target. First, the Nd laser creates a plasma plume. Next, the Yb laser reheats plasma plume by high intensity pulse at delay time of nanosecond. The properties of ions were investigated mainly on the base of time-of-flight method.  
DOI • reference for this paper ※ https://doi.org/10.18429/JACoW-IPAC2014-MOPRI009  
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