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TY - CONF AU - Shibuya, T. AU - Hayashizaki, N. AU - Yoshida, M. ED - Petit-Jean-Genaz, Christine ED - Arduini, Gianluigi ED - Michel, Peter ED - Schaa, Volker RW TI - Study on New Method for Generating Highly Charged Ions with Double Pulse Laser Ion Source J2 - Proc. of IPAC2014, Dresden, Germany, June 15-20, 2014 C1 - Dresden, Germany T2 - International Particle Accelerator Conference T3 - 5 LA - english AB - Laser ion source capable of generating high intensity ions is best for the ion source of RI beam facilities. A great deal of effort has been made on particle number as DPIS. Only few attempts have so far been made at generating highly charged ions. One of previous research has reported that Au+53 ions are produced by PALS laser. "Nonlinear process" mechanisms such as resonance absorption and self-focusing were used for this. However, these methods have limitation due to low repetition rate of the laser. Nd (λ=1064nm, E<1.2J, t~10ns) and Yb laser(λ=1030nm, E<10J, t~500fs) systems is possible to operate at 10 - 50Hz repetition rate. This double pulse laser system, with attainable laser intensity up to about 1017[W/cm²], was used to generate highly charged ions of solid target. First, the Nd laser creates a plasma plume. Next, the Yb laser reheats plasma plume by high intensity pulse at delay time of nanosecond. The properties of ions were investigated mainly on the base of time-of-flight method. PB - JACoW CP - Geneva, Switzerland SP - 595 EP - 597 KW - laser KW - ion KW - plasma KW - ion-source KW - controls DA - 2014/07 PY - 2014 SN - 978-3-95450-132-8 DO - 10.18429/JACoW-IPAC2014-MOPRI009 UR - http://jacow.org/ipac2014/papers/mopri009.pdf ER -