Author: Pei, X.T.
Paper Title Page
WEPME036 Simulation of the Trajectory of Electrons in a Magnetron Sputtering System of TiN with CST Particle Studio 2341
 
  • J. Wang, L. Fan, Y.Z. Hong, W.L. Liu, X.T. Pei, K. Tang, Y. Wang, W. Wei, Y.H. Xu, B. Zhang
    USTC/NSRL, Hefei, Anhui, People's Republic of China
 
  Funding: National Nature Science Foundation of China under Grant Nos.11075157.
In the process of magnetron sputtering deposition, electromagnetic fields have an important influence on the trajectory of particle movement and the properties of the TiN thin film in many cases. Even for simple geometries, the analytical prediction for charged particles trajectories is extremely cumbersome, so numerical simulations are essential to obtain a better understanding of the possible effects and helpful to optimize the design of experimental facility and experimental process. A software of CST PARTICLE STUDIOTM has been used to simulate the effect of magnetic and electric fields on electrons trajectories in the process of film coating. According to the simulation results, the improvement measures of the system design and experimental process have been achieved. The author put forward the improvement measures on film coating process according to the simulation results. The result shows that it is feasible and convenient to use three dimensional tool in the simulation of trajectory of electrons in a magnetron sputtering system.
 
DOI • reference for this paper ※ https://doi.org/10.18429/JACoW-IPAC2014-WEPME036  
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