Author: McCrory, E.S.M.
Paper Title Page
TUPD04 Third Generation Residual Gas Ionization Profile Monitors at Fermilab. 408
 
  • J.R. Zagel, M.L. Alvarez, B.J. Fellenz, C.C. Jensen, C.E. Lundberg, E.S.M. McCrory, D. Slimmer, R.M. Thurman-Keup, D.G. Tinsley
    Fermilab, Batavia, Illinois, USA
 
  Funding: DOE
The latest generation of IPM's installed in the Fermilab Main Injector and Recycler incorporate a 1 kG permanent magnet, a newly designed high-gain, rad-tolerant preamp, and a control grid to moderate the charge that is allowed to arrive on the anode pick-up strips. The control grid is intended to select a single Booster batch measurement per turn. Initially it is being used to allow for a faster turn-on of a single, high-intensity cycle in either machine. The expectation is that this will extend the Micro Channel Plate lifetime, which is the high-cost consumable in the measurement system. We discuss the new design and data acquired with this system.
 
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