TY - CPAPER
AU - Zagel, J.R.
AU - Alvarez, M.L.
AU - Fellenz, B.J.
AU - Jensen, C.C.
AU - Lundberg, C.E.
AU - McCrory, E.S.M.
AU - Slimmer, D.
AU - Thurman-Keup, R.M.
AU - Tinsley, D.G.
TI - Third Generation Residual Gas Ionization Profile Monitors at Fermilab.
J2 - Proc. of IBIC2014
AB - The latest generation of IPM's installed in the Fermilab Main Injector and Recycler incorporate a 1 kG permanent magnet, a newly designed high-gain, rad-tolerant preamp, and a control grid to moderate the charge that is allowed to arrive on the anode pick-up strips. The control grid is intended to select a single Booster batch measurement per turn. Initially it is being used to allow for a faster turn-on of a single, high-intensity cycle in either machine. The expectation is that this will extend the Micro Channel Plate lifetime, which is the high-cost consumable in the measurement system. We discuss the new design and data acquired with this system.
PB - JACoW
CY - Geneva, Switzerland
SP - 408
EP - 411
KW - controls
KW - electron
KW - detector
KW - proton
KW - ion
DA - 2014/10
PY - 2014
SN - 978-3-95450-141-0
UR - http://jacow.org/IBIC2014/papers/tupd04.pdf
ER -