Keyword: polarization
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MOPA13 Real-time Calculation of Scale Factors of X-ray Beam Position Monitors during User Operation electron, photon, factory, insertion 79
 
  • C. Bloomer, G. Rehm
    Diamond, Oxfordshire, United Kingdom
 
  Photoemission based X-ray Beam Position Monitors (XBPMs) are widely used at 3rd generation light sources to both monitor and stabilise the photon beam to sub-micron precision. Traditionally, finding the geometric scale factors requires either systematic stepper motor movements of the XBPM or well controlled electron beam displacements to measure the response of the XBPM. For each Insertion Device gap it is required to repeat this in order to build up a complete set of scale factors covering all possible operating conditions. Elliptically Polarising Undulators further complicate matters by having multiple operating modes which would require multi dimensional lookup tables. Presented in this paper is a method for retrieving the geometric scale factors of an XBPM in real time by making use of the intrinsic small random movements of the electron beam and finding the correlation in synchronous measurements from Electron BPMs and XBPMs at kHz sample rates.  
 
TUCC03 Design and Expected Performance of the New SLS Beam Size Monitor emittance, synchrotron, storage-ring, synchrotron-radiation 307
 
  • N. Milas, M. Rohrer, A. Saá Hernández, V. Schlott, A. Streun
    PSI, Villigen PSI, Switzerland
  • Å. Andersson, J. Breunlin
    MAX-lab, Lund, Sweden
 
  The vertical emittance minimization campaign at SLS, realized in the context of the TIARA WP6, has already achieved the world's smallest vertical emittance of 0.9 pm in a synchrotron light source. The minimum value reached for the vertical emittance is only five times bigger than the quantum limit of 0.2 pm. However, the resolution limit of the present SLS emittance monitor has also been reached thus, to further continue the emittance minimization program the construction of an improved second monitor is necessary. In this paper we present the design and studies on the performance of this new monitor based on the image formation method using vertically polarized synchrotron radiation in the vis-UV spectral regimes. This monitor includes a new feature, providing the possibility of performing full interferometric measurement by the use of a set of vertical obstacles that can be driven on the light path. Simulations results are used to investigate the possible source of errors and their effects on imaging and the determination of the beam height. We also present the expected performance, in term of emittance accuracy and precision, and discuss possible design limitations.  
slides icon Slides TUCC03 [8.497 MB]