Author: Shimada, M.
Paper Title Page
MOPCTH010 Design Work of the ERL-FEL as the High Intense EUV Light Source 4
 
  • N. Nakamura, S. Chen, T. Furuya, K. Haga, I. Hanyu, K. Harada, T. Honda, Y. Honda, E. Kako, Y. Kamiya, R. Kato, H. Kawata, Y. Kobayashi, T. Konomi, T. Kubo, S. Michizono, T. Miyajima, H. Nakai, T. Obina, K. Oide, H. Sakai, S. Sakanaka, M. Shimada, K. Tsuchiya, K. Umemori, M. Yamamoto
    KEK, Ibaraki, Japan
  • R. Hajima, N. Nishimori
    JAEA, Ibaraki-ken, Japan
  
  Energy recovery linac(ERL)-based free electron lasers(FELs) are promising candidates for high-power EUV sources. They can recover most acceleration energy from the electron beams and greatly reduce the dumped beam power and activation compared with those based on ordinary linear accelerators. We have investigated a feasible design of a 10-kW class ERL-FEL operated at 13.5 nm for EUV lithography applications. In this talk, we will present the design work of the ERL-FEL as the high-power EUV source.  
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TUICLH2033
 HOM-BBU Simulation for KEK ERL Light Source  
 
  • S. Chen, N. Nakamura, M. Shimada
    KEK, Ibaraki, Japan
  
  In KEK, an multi-GeV ERL based light source with 100mA maximum average beam current, is under designing. A special designed KEK ERL mode-2 superconducting cavity will be used. In this paper, the multi-pass BBU of KEK ERL light source is simulated. The dependency of BBU threshold current of various conditions are presented.  
slides icon Slides TUICLH2033 [2.958 MB]  
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