Author: Sakanaka, S.
Paper Title Page
MOPCTH007
 Successful Result of the Commissioning on cERL in KEK  
 
  • S. Sakanaka
    KEK, Ibaraki, Japan
  
  The Compact ERL (cERL) is a superconducting test accelerator aimed at establishing technologies for the ERL-based future light source. After its construction during 2009 to 2013, the first CW beams of 20 MeV were successfully transported through the recirculation loop in February 2014*. Since then, various accelerator studies have been carried out. We have so far succeeded in recirculating CW beams of 30 uA through the loop with very-small beam losses. Initial emittance measurements were carried out in the recirculation loop. We also carried out commissioning of a X-ray source using the laser Compton scattering**. During these studies, both a photocathode DC electron gun and superconducting cryomodules have been worked very stably. We present our results of cERL commissioning, measured beam properties, operational status, and future prospect.
* N. Nakamura et al., IPAC2014, MOPRO110; S. Sakanaka et al., LINAC14, TUPOL01.
** R. Nagai et al., IPAC2014, WEPRO003.
 		 
slides icon Slides MOPCTH007 [3.175 MB]  
Export • reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)  
 
MOPCTH010 Design Work of the ERL-FEL as the High Intense EUV Light Source 4
 
  • N. Nakamura, S. Chen, T. Furuya, K. Haga, I. Hanyu, K. Harada, T. Honda, Y. Honda, E. Kako, Y. Kamiya, R. Kato, H. Kawata, Y. Kobayashi, T. Konomi, T. Kubo, S. Michizono, T. Miyajima, H. Nakai, T. Obina, K. Oide, H. Sakai, S. Sakanaka, M. Shimada, K. Tsuchiya, K. Umemori, M. Yamamoto
    KEK, Ibaraki, Japan
  • R. Hajima, N. Nishimori
    JAEA, Ibaraki-ken, Japan
  
  Energy recovery linac(ERL)-based free electron lasers(FELs) are promising candidates for high-power EUV sources. They can recover most acceleration energy from the electron beams and greatly reduce the dumped beam power and activation compared with those based on ordinary linear accelerators. We have investigated a feasible design of a 10-kW class ERL-FEL operated at 13.5 nm for EUV lithography applications. In this talk, we will present the design work of the ERL-FEL as the high-power EUV source.  
slides icon Slides MOPCTH010 [4.589 MB]  
Export • reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)